Used AMAT / APPLIED MATERIALS ENDURA #9266968 for sale
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ID: 9266968
Wafer Size: 8"
PVD System
Load lock: Narrow body (Automated)
Buffer robot: HP
XFER Robot: VHP
Chamber-A: Pass-tru
Chamber-B: Cool
Chamber-C: PC2
LEYBOLD Turbovac 361C Turbo pump
Chamber-D: TiN
Body: Wide
Magnet: K3/P4 Source
Pedestal: 101
CTI-CRYOGENICS On-Board cryo pump
DC Power missing
Chamber-E and F: Orienter-Degas
Chamber-L: Gamma II TI
Body: Wide
Magnet, P/N: 0010-20328
CTI-CRYOGENICS On-Board cryo pump
DC Power:
Master: MDX-L12M-650
Slave: MDX-L12M-650
Chamber-2: AL
Body
Magnet, P/N: 0010-20328
Pedestal: Clamp
CTI-CRYOGENICS On-Board cryo pump
Chamber-3: Ti
Body: Wide
Magnet, P/N: G12 0010-20225
CTI-CRYOGENICS On-Board cryo pump
Chamber-4: TiN
Body: Wide
Magnet: G12
Pedestal: 101
CTI-CRYOGENICS On-Board cryo pump
DC Power:
Master: MDX-L12M
Slave missing.
AMAT / APPLIED MATERIALS ENDURA Reactor is a large vacuum processing device used in the fabrication of semiconductor-based circuit boards. Specifically, AMAT ENDURA Reactor is used in the CVD (Chemical Vapor Deposition) process, which is a key step in the production of modern semiconductor components. APPLIED MATERIALS ENDURA Reactor is made up of four major components: the vacuum chamber, the process inlet and outlets, the gas delivery equipment, and the control system. The vacuum chamber is a hermetically sealed vessel that is designed to maintain maximum cleanliness and vacuum levels within the chamber. The process inlet and outlet provide access from the ambient environment to the chamber, allowing gases to enter and products to be removed at the completion of a process cycle. The gas delivery unit is used to inject specific inert and reaction gases into the reactor chamber, which then interact with the substrate material in the CVD process. Finally, the control machine allows the operator to precisely monitor and control the settings of the chamber, gas delivery, and process parameters to ensure a consistent and high-quality product. The features of ENDURA Reactor make it an ideal choice for the fabrication of advanced semiconductor components. It can reach temperatures up to 1000°C, allowing for the interaction of reaction gases with substrates at the atomic level to form intricate structures such as high-K dielectrics and other complex materials. AMAT / APPLIED MATERIALS ENDURA is also optimized for high throughput, allowing for the rapid processing of wafers / substrates in CVD production. The precise control of the reactor environment and process parameters enable accurate and repeatable results, while the integrated safety systems ensure operator safety at all times. Overall, AMAT ENDURA Reactor is an advanced vacuum processing tool designed for the CVD process of fabricating semiconductor devices. Its precise controls and robust features enable accurate and repeatable performance, making it a reliable and best-in-class choice for advanced fabrication processes.
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