Used AMAT / APPLIED MATERIALS ENDURA #9272620 for sale

AMAT / APPLIED MATERIALS ENDURA
ID: 9272620
System.
AMAT / APPLIED MATERIALS ENDURA is a revolutionary high-throughput reactor that has revolutionized semiconductor and nanotech manufacturing. AMAT ENDURA equipment is designed to be extremely flexible, with full control of deposition process parameters. This allows users to quickly adapt to changing process needs. The system also benefits from plasma-enhanced deposition technology that improves material quality and throughput. The unit is equipped with a high-tech chamber vacuum that allows for even and reliable deposition. This ensures minimal particle contamination, shifting all process steps into one, which ultimately leads to better yields. APPLIED MATERIALS ENDURA is designed to be a modular machine, which allows for increased flexibility and scalability. The reactor is also designed with a multi-well configuration that allows for more efficient use of process space. This allows for easier installation of non-standard equipment, such as quartz masks for photolithographic applications, as well as a wide variety of precursors for deposition. ENDURA also features a powerful software platform with customizable control settings to meet various application needs. This includes advanced multi-zone control capabilities that enable precise control of deposition characteristics. The tool also features monitoring and remote diagnostics capabilities. In addition, AMAT / APPLIED MATERIALS ENDURA is very energy efficient, thanks to a unique cooling asset that only uses energy when required. This model features a patented gas dynamic cooling technology that is capable of maintaining high process temperatures, even in long-duration runs. AMAT ENDURA is a high-performance equipment that is suitable for many different processes, ranging from ALD to CVD deposition. It is capable of producing high-quality results with minimal waste of valuable resources. With its flexibility and scalability, it can be used in both production and research environments, and it is well suited for a wide range of applications.
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