Used AMAT / APPLIED MATERIALS ENDURA #9312918 for sale

AMAT / APPLIED MATERIALS ENDURA
ID: 9312918
Wafer Size: 12"
PVD Systems, 12".
AMAT / APPLIED MATERIALS ENDURA is a highly advanced etch and deposition reactor that is commonly used in the manufacture of semiconductor materials. Its ability to produce extremely precise nanotechnological components is unsurpassed, making it a powerful and reliable tool in the semiconductor industry. AMAT ENDURA is a single-wafer reactor chamber system used for etch and deposition processes. The shape of the chamber is such that it provides uniformity in plasma and optical flux. The interior consists of two opposite electrodes, each of which is powered by a 13.56 MHz RF source. APPLIED MATERIALS ENDURA's plasma source is optimized to ensure precise placement of ions, leading to tight process control. This also helps to minimize electrical fields and reduce drift. The design of the reactor results in superior etch uniformity and more precise surface characteristics. Deposition processes can be tailored to achieve a specific resistivity, film composition, and dopant profile. To keep the environment in the chamber consistent, ENDURA utilizes a series of shields and shields to separate the substrate from the plasma to reduce potential damage. This also helps to minimize electrical fields and drift. To further protect the substrate, the reactor is equipped with automated flush pumps that control the pressure within the chamber and keep it at a safe operating level. AMAT / APPLIED MATERIALS ENDURA has a number of valuable features to improve throughput, including a multi-pocket pyrolytic liner and high-purity gas lines. Additionally, the system can be interfaced with automation to make the processes easier to manage, such as carrying out operations in batch mode and managing wafer stacks how you want them to. AMAT ENDURA is a proven and cost-effective tool used in many operations, designed to provide significant process improvements, versatility, and superior yields. Its reliable performance makes it an ideal solution for processes where small features, yields, and cost are important.
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