Used AMAT / APPLIED MATERIALS Frame for P5000 #9235976 for sale

AMAT / APPLIED MATERIALS Frame for P5000 is a deposition-based vacuum processing reactor that is used for the production of complex thin-film products. The P5000 is designed for high throughput, cost-effective production and provides a wide range of process capabilities. It is ideal for robust, complex process needs and is equipped with a unique dual-process chamber that is capable of both deposition and etch processing. The P5000 utilizes a versatile 5x500mm wafer platform for processing substrates up to 300mm. It features the capability for low-cost particle engineering and surface analysis of substrates while still meeting high productivity standards. Additionally, the P5000's dual chamber design offers users the ability to independently process two different substrates simultaneously or can be used to carry out dual process operations on the same substrate at different points in the process. This provides a great level of flexibility for both R&D and production level customers. The P5000's advanced material equipment includes a high-end turbomolecular pump as the primary pumping solution with the ability to add a secondary backing pump to improve throughput and reduce process times. The frame is also configured with a programmable gas panel, enabling users to quickly and easily adjust process parameters on-the-fly. In addition, the system offers Tech/NoTech deposition and analysis systems, providing excellent diagnostics and real-time process control. The P5000 is equipped with a wide range of features designed to provide reliable, low cycle-times and superior quality control, including an automatic wafer transfer unit, real-time process optimization, and a computer-controlled maintenance protocol. The machine is also capable of performing in both high-temperature and low-temperature environments, allowing users to tailor the process to specific requirements. Overall, AMAT Frame for P5000 is an advanced reactor that is designed for high-throughput and low-cost production of complex thin-film products. It features a unique dual-chamber design that provides users with great versatility and the ability to independently process two different substrates at the same time. The P5000 offers a cutting-edge material tool and a comprehensive range of features and capabilities, making it an ideal solution for industrial applications and R&D customers.