Used AMAT / APPLIED MATERIALS G5 MESA HPK #293608989 for sale

AMAT / APPLIED MATERIALS G5 MESA HPK is a high-performance etch/oxidation reactor capable of performing a wide range of etching, deposition and oxidation processes. The highly configurable equipment includes a stepper motor and a high-speed, high-resolution multi-axis scanner, making it ideal for processes such as plasma etching, reactive ion etching (RIE), sputtering, oxidation, and thin-film deposition. AMAT G5 MESA HPK is designed to provide maximum process uniformity across the wafer. The unit's main components are a chamber, a gas handling system, and a vacuum unit. The chamber is made from stainless steel, with a quartz viewport to allow for viewing of processing. To ensure maximum uniformity, the chamber is equipped with a multi-zone gas distribution machine, a multipoint RF generator and a multiple antenna design, along with a microwave power supply that enables independent frequency control to each antenna. The tool also features an advanced computer control asset, which is capable of controlling the model through WaferWorks software. The software allows users to adjust parameters such as chamber pressure, wafer temperature, RF power levels and antenna parameters with ease. Additionally, the software monitors reaction activities and diagnostics to ensure that all processes are running smoothly. The gas handling equipment for APPLIED MATERIALS G5 MESA HPK is designed to provide accurate and repeatable results. It is capable of controlling both mass-flow controlled channels and source valves, with a mixture of well-defined gases from a variety of sources. The system allows for a variety of testing gases and etch chemistries, ensuring that users can customize their processes for specific needs and applications. G5 MESA HPK also features a vacuum unit, including an ion pump, a gettering chamber, a cryopump, and a turbo pump. The combination of these systems allows for high vacuum levels, ensuring that all reaction activities occur in an ultra-low-contamination environment. Overall, AMAT / APPLIED MATERIALS G5 MESA HPK is an advanced etch/oxidation reactor ideal for a variety of processes. From plasma etching, sputtering, oxidation and thin-film deposition, to advanced computer control and sophisticated gas handling and vacuum systems, this high-performance machine ensures that users can achieve the highest levels of uniformity and repeatability across their wafers.