Used AMAT / APPLIED MATERIALS G5 MESA #9311362 for sale

AMAT / APPLIED MATERIALS G5 MESA is a 200-millimeter, high-temperature, deep-silicon etch reactor developed for advanced semiconductor device fabrication. It provides excellent selectivity and etch uniformity in features with aspect ratios as high as 10, and is suitable for MEMS applications and other etching processes such as Norwood and Unibond. AMAT G5 MESA reactor features advanced process optimization and control algorithms, providing superior etch uniformity over a range of substrate materials. Its integrated process control monitoring and fault detection algorithms adjust the etch rate without sacrificing throughput. It also features advanced oxygen delivery control for faster cycle time and improved selectivity. APPLIED MATERIALS G5 MESA react creates a highly oxygenated etch environment to improve feature selectivities and further enhance process performance. G5 MESA reactor is suitable for etching silica-based substrates, such as quartz, optical glass and sapphire, and lends itself to etching of thin films, bonded wafers, and multi-chip modules. It has a high-resolution image-processing optics system, which allows users to adjust resolution settings for large area or small feature applications. It also features a gas delivery system with real-time sensor-based components, which optimizes etch performance. In addition, AMAT / APPLIED MATERIALS G5 MESA reactor provides high temperature capability for improvements in plasma stability, and helps with the selectivity and uniformity of profile and geometry of etched features. The advanced etch process control algorithms combine with the high temperature capability to yield superior process performance. The large process window available in AMAT G5 MESA reservoir further enhances the device throughput. APPLIED MATERIALS G5 MESA reactor is designed for multi-user applications in research, process control, failure analysis and device production. It is highly configurable and is compatible with existing lithography systems, allowing for multiple process modules and systems integration. With an advanced range of available process optimization and control algorithms and an extensive list of available options, G5 MESA reactor provides excellent device yield and improved process performance.