Used AMAT / APPLIED MATERIALS H20 VDSII #293647380 for sale
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AMAT / APPLIED MATERIALS H20 VDSII is a high performance, cost-effective chemical vapor deposition (CVD) equipment for semiconductor processing. The reactor is designed for the deposition of thin films at low temperatures and with minimal contamination and gas loading. The system's components include a power supply that supplies electricity to the process chambers, a vacuum pump, a reactant feed unit and a process exhaust. The power supply is a DC/AC converter that is capable of supplying currents up to 30amps at 500volts. The vacuum pump is a turbomolecular pump that provides a base and source vacuum pressure of 2.5e-7 torr and 5e-7 torr respectively. The reactant feed machine has precision flow control valves and pumps, and the process exhaust is a multi-nozzle diffusion tool that removes products of reaction and particles from the reactor. AMAT H20 VDSII is capable of performing a range of CVD processes, including direct and selective CVD, wet oxidation and nitride passivation. The deposition temperature range extends from room temperature to 850°C, with a deposition rate of 6-8microns/minute depending on process conditions. The asset can host up to 16gas lines, allowing for the processing of a wide range of materials. The reactor is designed to maximize process repeatability and to minimize maintenance needs. It has an automated wafer reconditioning model in which the wafers are transferred from the load station to the reconditioning station in order to remove any particle contamination from previous processes. The equipment also features a number of safety features such as ground fault sensors, for protection of personnel and assets. The superior design of APPLIED MATERIALS H20 VDSII ensures maximum processing efficiency and uniformity across a wide range of substrates. Its energy efficiency, minimized gas loading and wide process window make it an ideal system for the deposition of semiconductor films. This cost-effective unit is suitable for research and development as well as commercial production applications.
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