Used AMAT / APPLIED MATERIALS MOCVD HP+ chamber #9046115 for sale

AMAT / APPLIED MATERIALS MOCVD HP+ chamber is a metal organic chemical vapor deposition (MOCVD) reactor designed to enable the growth of high-performance semiconductor materials such as InP, GaAs, and GaN. The unique design of the HP+ chamber provides manufacturers with an exceptionally high level of control over the process, enabling precise control over the quality of the material and the growth rate. The HP+ chamber is designed with two independently operated reflector electron beam sources, a top and bottom. These sources optimize the uniformity of the deposition process, as each can be individually adjusted to compensate for any variation in uniformity caused by the substrate itself. In addition, the reflectors are removable for rapid cleaning and maintenance. The source assembly also includes a unique, stand-alone RF biasing source that enables precise control of the material composition and thickness. The reaction chamber of the HP+ chamber is designed for maximum uniformity. The chamber is elliptically shaped, allowing for a symmetric and uniform distribution of the reactive species. In addition, the chamber is enclosed in a high-temperature jacket, isolating it from ambient contaminants which can reduce the uniformity of the deposition. The reaction chamber is augmented with several additional features which significantly improve the performance of the HP+ chamber. An Ultra Fast Mechanical Shut Off (UFMO) shutter is installed at the top of the chamber, allowing the process to be stopped in minutes rather than hours. An external deposition monitoring system provides real-time monitoring of the deposition process, enabling rapid corrective action proactively and before the substrate is affected. An automated gas flow control system and a temperature control system are included for precise control of the deposition conditions. The HP+ chamber also features several advanced safety features. A two-stage lockout key ensures maximum safety in case of any emergency. In the first stage, the shutoff shutter is closed to stop the flow of gases into the chamber. In the second stage, the feed gas lines are cut off to ensure complete gas cutoff. Overall, AMAT MOCVD HP+ chamber provides a powerful and reliable solution for the manufacture of high-performance semiconductor materials. Its unique design allows for precise control of the deposition process, resulting in higher quality materials with improved yields. Furthermore, its advanced safety features ensure the safety of the process and those operating the machine.