Used AMAT / APPLIED MATERIALS MOCVD HP Standard #9007740 for sale

AMAT / APPLIED MATERIALS MOCVD HP Standard is an advanced Metal Organic Chemical Vapor Deposition (MOCVD) reactor designed for epitaxial growth of III-V compound semiconductor materials. It is widely used to build thin layers of semiconductor compounds on a substrate. The reactor consists of a heated chamber, two quartz tubes, and a set of deposition sources. The reactor chamber is equipped with an ultra-high vacuum mode, meaning that a better atmosphere environment for higher growth rates can be created. This chamber can be heated up to 1000°C through a powerful two-zone quartz tube furnace, allowing for thicker films and accurate regulation of the growth temperatures. Additionally, the high temperature thermal resistant wall and linear transfer inserts reduce the thermal spending of the chamber to the minimum. The quartz tubes, on the other hand, are used to separate the active and passive zones of the reactor. Moreover, they allow for a precise distribution of the reactant throughout the chamber volume, keeping an even growth. The set of sources also includes an injected source for pellets and an electron beam source for single source materials. AMAT MOCVD HP Standard also features a large growth area, with the chamber walls constantly monitored in order to prevent wire-by-grain etching. This is done by the efficient pressure control system, along with various kinds of protective materials. In order to further ensure good results, the activation of the source materials is done after thorough analysis of the doping concentration in the sample. In conclusion, APPLIED MATERIALS MOCVD HP Standard is an advanced reactor suited for highly efficient epitaxial growth of III-V compound semiconductor materials. It includes an ultra-high vacuum chamber, powerful quartz tubes, and a set of deposition sources, along with various protective materials and systems in order to maximize the quality of the samples.