Used AMAT / APPLIED MATERIALS MST #9227637 for sale

AMAT / APPLIED MATERIALS MST is a reactor designed for semiconductor device fabrication. It is an advanced form of chemical vapor deposition (CVD) reactor and is used to deposit layers of metal, oxide, nitride, and other metalorganic materials onto substrates of silicon, silicon carbide, gallium arsenide, and diamond, among others. In AMAT MST reactor, the material to be deposited is sourced from a chamber adjacent to the reaction chamber (which also serves to keep the reaction chamber clean). The source material is initially heated and then flows into the reaction chamber where it is exposed to a plasma (a highly energized gas) generated by an inductively-coupled radio frequency (RF) source. The plasma breaks down the source material molecules, which then deposit onto the substrate material surface in a thin, uniform and conformal film. The substrate material is heated by an electron cyclotron resonance (ECR) source to assist in the deposition process. APPLIED MATERIALS MST reactor offers increased process precision and lower thermal budget compared to traditional CVD systems, providing significantly better device performance. Its CVD precursors and processing parameters can be accurately controlled during each deposition step, allowing for precise control over material composition, feature sizes, layer thicknesses, and interfaces between deposited and existing materials. The repeatability and uniformity of CVD layers provide a high degree of process yield rates and reliable device performance. The plasma provides a low-pressure working environment, independent of pressure-sensitive material properties, which is ideal for some materials such as nitrides and oxides. The components of MST reactor are designed for reliable, long-term operation. The reaction chamber itself is constructed from 304 stainless steel, while the walls and shields are made from an alloy of aluminum and molybdenum. The heaters and motors used to control the RF source and substrate temperature are robust and reliable, and the hermetically-sealed vessel helps to prevent out-gassing of molecular species from within the reactor. The automated operation of the reaction chamber enables unmanned processing in an industrial environment. In summary, AMAT / APPLIED MATERIALS MST reactors are used for the deposition of conformal thin-film layers onto a substrate. Its precise control of material composition, layer thicknesses, feature sizes, and uniformity enables reliable device performance and high process yields. AMAT MST systems employ a low-pressure plasma environment that is ideal for certain materials such as oxides and nitrides. Its robust componentry and automated operation make it suitable for long-term, high-volume use in industrial settings.