Used AMAT / APPLIED MATERIALS MxP+ Oxide chamber for Centura #293656085 for sale

AMAT (APPLIED MATERIALS) AMAT / APPLIED MATERIALS MxP+ Oxide chamber for Centura is a critical piece of equipment in semiconductor technology. This reactor is used for high-precision deposition of various oxides and nitrides in semiconductor fabrication. It is designed with a high throughput and maximum reliability to yield consistent results in production. The MxP+ Oxide Chamber consists of an enclosure made of stainless steel, housing the deposition process. The process is managed with a PECVD controller to ensure the right conditions for a successful deposition. Inside the reactor, a quartz tube is placed to hold the target materials for oxidation. This is done in combination with a gas-delivery system to deposit the desired materials. This can range from tungsten silicates to phosphorus-doped oxides. The MxP+ Oxide Chamber is designed for high-aspect ratio features and is cooled by its own cooling system. It has two-point temperature control and also provides a temperature range of -60°C to 400°C. The reactor also has a vacuum pump to ensure a better deposition. To further guarantee a consistent deposition, the MxP+ Oxide Chamber is equipped with a residual gas analyzer which checks for the presence of gases. The operating pressure is monitored by an ion gauge and controlled by a turbo-molecular pump. The MxP+ Oxide Chamber operates using predictive software that utilizes process modeling mechanics to give the reactor better control during production. This software is constantly updated in order to stay ahead of market needs. AMAT MxP+ Oxide chamber for Centura is an essential component for successful deposition of materials in the semiconductor industry. This reactor is designed to not only increase throughput, but also provide reliable results. By optimizing pressure, temperature, and residual gas concentration, the MxP+ Oxide Chamber is able to provide the accurate deposition that the semiconductor industry requires.