Used AMAT / APPLIED MATERIALS MxP+ #293749250 for sale

AMAT / APPLIED MATERIALS MxP+ is a next generation Plasma Enhanced CVD (PECVD) single wafer reactor for advanced dielectric and metallic film deposition. The equipment was built to provide low-cost cluster tool manufacturing abilities for tight process control and optimized device parameters that result in superior film quality. AMAT MxP+ reactor utilizes Electron Cyclotron Resonance (ECR) plasma sources to generate a high density sheath potential, allowing for larger ionized species to escape the plasma and get into the low pressure deposition chamber. This sheath potential also prevents electron outs from exiting the chamber, creating a higher ion bombardment pressure. Additionally, its unique fluid injection technology is able to precisely control the densities of ions on the wafer for optimal deposition thickness, adhesion and flatness. The system also features low cost of ownership and a tightly sealed vacuum chamber to minimize contamination and maintain a consistent process. APPLIED MATERIALS MxP+ reactor can be used to deposit high quality dielectric films such as ALD, high-K, and low-k materials with excellent uniformity, step coverage and excellent thermal/mechanical property distribution. Additionally, the reactor is capable of depositing metallic films such as aluminum, copper and tungsten, allowing for greater protection against electromigration and improved conductivity. Furthermore, MxP+ reactor is well-suited for use in semiconductor MEMS and optoelectronics applications. In addition to its enhanced PECVD capabilities, the unit also features several advanced sensors for complete process monitoring and control. This includes measures for ion energy, ion energy distribution and plasma density, allowing for more precise tuning of the process parameters and more effective monitoring of the deposition process. The machine can also be integrated with external process control software and automated feed-forward systems for enhanced feedback control. Overall, AMAT / APPLIED MATERIALS MxP+ is an advanced PECVD single wafer reactor. It provides improved ionized species transport to the substrate and precise control of plasma parameters for higher quality film deposition. Its integrated sensors also allow for real time monitoring and feedback control, as well as a tightly sealed vacuum chamber to keep out contaminants. This makes it an ideal tool for advanced dielectric and metallic film deposition in semiconductor MEMS and optoelectronic applications.