Used AMAT / APPLIED MATERIALS Olympia #9293600 for sale

AMAT / APPLIED MATERIALS Olympia
ID: 9293600
Wafer Size: 12"
Vintage: 2015
System, 12" SiN, LowK, ALD 2015 vintage.
AMAT / APPLIED MATERIALS Olympia is a leading-edge reactor designed for deposition of thin films in both IC manufacturing and semiconductor applications. It is based on AMAT proprietary core application engine called Atomic Layer Deposition technology (ALD). AMAT Olympia reactor is composed of two concentric reactors connected by a vertical gas-phase volume containing a patented rotating quad-pin nozzle. Each reactor occupies one-fourth of the gas-phase volume, while the quad-pin nozzle provides a uniform deposition rate and uniformity across the entire substrate surface, as well as efficient gas-phase distribution. APPLIED MATERIALS Olympia reactor is capable of depositing a variety of materials including metal oxides, sulfur, nitrogen, chlorine, boron, and other high-dielectric materials. The uniform deposition rate and uniformity are designed to ensure a reproducible process for each application. The rotating quad-pin nozzle allows for precise control over the deposition process with adjustable parameters including nozzle angle, nozzle speed, gas-phase concentration, and sweep rate. The accurate control over the deposition is further enhanced by the reactor's automated gas pressure monitoring. This helps ensure the most consistent results possible. Olympia reactor also features advanced automated thermal management. This feature allows for precise control of the substrate heating process, ensuring predictable deposition. The automated thermal management helps reduce defects, as well as the possibility of thermal damage during the deposition process. AMAT / APPLIED MATERIALS Olympia reactor is equipped with an integrated gas-bulk delivery system that uses high-pressure nitrogen to provide superior growth control. The high-pressure nitrogen ensures a consistent rate of deposition and is essential to applications that require higher-precision results. The reactor also offers auto-centering capabilities, making it easier to center the substrate and reducing the possibility of damage caused by misalignment. AMAT Olympia reactor is a versatile deposition system with uses in industry, research, and other applications. Its reliability and repeatability make it an excellent choice for repeatable, long-term deposition processes. Its advanced thermal handling ensures accurate temperature control, ensuring predictable deposition rates and uniformity. The advanced gas-bulk delivery system ensures consistent gas-phase concentration, providing excellent control over the deposition process for a variety of materials.
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