Used AMAT / APPLIED MATERIALS Oxide chambers for MxP+ #293650013 for sale

AMAT / APPLIED MATERIALS Oxide chambers for MxP+ are a state-of-the-art, high-performance oxide reactor. This equipment comes with two process chambers, each equipped with separate independent power sources, enabling separate oxide reactor configurations or simultaneous loading of your wafers. It has been specially designed to address the challenges of contemporary next-generation device features, such as both layered and in-device structures, and provides extreme process stability, precision, and repeatability. AMAT Oxide chambers for MxP+ have the flexibility to accept a wide range of precursors, including nitrous oxide (N2O), low-k fluorinated gas, and a variety of silicon, germanium, and organometallic reactants. They have an integrated HD-OFF-III hot-wall CVD process and are capable of handling both high-temperature annealing and high-pressure processes. The system can use multiple gases, and due to the use of independent power sources, the unit is designed to prevent interference while the wafers are being processed. The basic oxidation process of APPLIED MATERIALS Oxide chambers for MxP+ is both rapid and reliable, and the resultant dielectric films are uniformly distributed on both silicon and metal-oxide-semiconductor (MOS) devices. In terms of thin film passivation, the Oxide chambers provide uniformity with standard-by-standard films that are processable on various substrates with various etch chemistries. Also, the Oxide chambers offer repeatable openings in the films and consistent fill rates. Additionally, Oxide chambers for MxP+ come equipped with a high-performance optical profiler and advanced video microscopes for real-time process control and monitoring of films, ensuring high accuracy results consistently. In addition to the process chamber, this machine also comes with a software package designed to make operation and maintenance of the tool easy and convenient. This software provides accurate process controls, reporting, and process recipes management, as well as detailed fault displays and alarms. AMAT / APPLIED MATERIALS Oxide chambers for MxP+ is an ideal choice for those needing a reliable and highly efficient oxide reactor for processing their most advanced electronic devices. With its robust design and processes control, this asset provides the required precision and repeatability at the highest levels of accuracy and throughput.