Used AMAT / APPLIED MATERIALS P5000 Mark II #9213668 for sale

AMAT / APPLIED MATERIALS P5000 Mark II reactor is a plasma-enhanced chemical vapor deposition equipment optimized for deposition applications requiring high quality films. AMAT P5000 Mark II is equipped with two chambers and offers two process options - IDPECVD (Ionized Deposition Process) and MPPECVD (Multi Plauna Power Enhanced Chemical Vapor Deposition). IDPECVD is a deposition process which is initiated by the energetic bombardment of a precursor gas within the deposition chamber by an electron beam at relatively high power densities. MPPECVD is a non-energetic deposition process which is used to produce films at lower power densities with greater uniformity. Both processes are key to the production of films with superior quality, adhesion, and uniformity. APPLIED MATERIALS P 5000 MARK II reactor is designed with a top-loading loading mechanism which makes it easy to access the deposition chamber for loading and unloading wafers. The top-loading substrate racks enable the user to load 600mm wafers at high throughput rates. APPLIED MATERIALS P5000 Mark II reactor also incorporates high-performance pitch-catch manipulators for high quality in-situ metrology and gas delivery systems for precise on-the-fly reaction control. To enhance the performance of AMAT / APPLIED MATERIALS P 5000 MARK II reactor, the system also incorporates a number of advanced measurement and control features. These include four-pointRF unit capable of independent frequency steering and matching, on-the-fly power control,and feedback control of film thickness via infra-red measurement. Additionally, the machine is capable of measuring film thickness, optical characteristics, and electrical characteristics with sub-micron accuracy. To ensure safety and process control, AMAT P 5000 MARK II reactor includes several safety features such as an over-temperature protection tool, over-pressure protection asset, and an automated pressure controller. The automated pressure controller precisely controls the reaction pressure within the chamber to ensure safe and accurate performance in every process. P5000 Mark II reactor is an advanced deposition model designed to produce high quality films with superior uniformity, adhesion, and optical, electrical, and thermal characteristics for a variety of industrial applications. This process-specific reactor is equipped with key safety features and advanced metrology, measurement, and control systems for reliable and repeatable performance.