Used AMAT / APPLIED MATERIALS P5000 Chamber #9186167 for sale

AMAT / APPLIED MATERIALS P5000 Chamber is a high-performance reactor designed to enable rapid, precise, and accurate processing during semiconductor device fabrication. With its advanced features, AMAT P5000 Chamber provides the highest levels of temperature uniformity, repeatability, and temperature control for critical applications. APPLIED MATERIALS P5000 Chamber is comprised of two distinct sections - a processing section and a thermal isolation chamber. The processing section consists of a vacuum chamber that houses the substrate during processing, an upper stage chuck that supports the substrate during processing, a lower electrostatic chuck for backside temperature control, and a quartz-configured susceptor/lift pin, which provides accurate substrate positioning during processing. Also included is a gas-to-substrate delivery equipment that provides precise delivery of all gases to the substrate at different pressure and flows as required. The thermal isolation chamber provides an isolated environment for the substrate and allows for the temperature of individual parts of the substrate to be controlled with greater accuracy. The isolation chamber houses a unique mechanism, known as the "shutter system," that helps to regulate and maintain the temperature uniformity of the substrate during processing in P5000 Chamber. The shutter unit shutters itself automatically when the processing is complete, ensuring an optimal environment for processing. This thermal isolation is also beneficial during startup and shutdown of the machine, as it keeps the substrate or chamber temperature changes to a minimum. AMAT / APPLIED MATERIALS P5000 Chamber is also designed with a range of other features to support precise and accurate processing. It includes an automated wafer transfer and centering tool, an in-situ residual gas analyzer that allows for precise gas control, and a multi-gas delivery asset. The chamber is equipped with a highly advanced inert gas environment management model, which eliminates worries of possible contamination of the substrate. AMAT P5000 Chamber is designed to provide reliable results and maximum flexibility in a wide range of processing requirements. Its superior temperature uniformity, repeatability, and temperature control capabilities makes it ideal for a variety of applications, including CVD, etching, oxidation, metal deposition, and more. APPLIED MATERIALS P5000 Chamber is an invaluable tool for any semiconductor fabrication facility, enabling precise, repeatable, and uniform processing results.