Used AMAT / APPLIED MATERIALS P5000 DxZ #9183838 for sale

AMAT / APPLIED MATERIALS P5000 DxZ is a sophisticated high-temperature chemical vapor deposition (HTCVD) reactor capable of enabling the deposition of thin films at temperatures up to 1,400 °C. This reactor is designed for research and industrial applications, such as the production of metal-oxide thin films and silicon carbide layers, which have a wide range of material and electrical properties. AMAT P5000 DxZ is a multi-zone equipment where each zone operates independently and has its own control parameters, such as temperature, flow rate, reactant concentrations, chamber pressure, etc. The temperature inside each zone can be adjusted up to 1,400 °C, either in a uniform or step-wise fashion, while the internal pressure can be maintained between 6 and 40 mbar. The reactants are delivered into each zone through dedicated inlets, whereas each zone also contains a showerhead through which unreacted reactants can be backflushed. APPLIED MATERIALS P5000 DxZ has a unique tubular construction featuring twelve concentric cylindrical parts, which serve as heating elements and containment vessels for the process gas. These parts are fabricated with high-purity molybdenum and coupled with a water-cooled copper heat shield, and together they provide excellent thermal control and uniform heating across the entire substrate area. The total system temperature uniformity is typically better than ±1 °C. P5000 DxZ includes advanced safety features, such as process monitoring, automated accident detection, explosion protection, failure alert notification, etc. It is also equipped with an advanced control unit featuring user-friendly graphical user interface and remote monitoring capabilities, making it easy to integrate into an existing process control machine. Overall, AMAT / APPLIED MATERIALS P5000 DxZ is an excellent choice for high-temperature deposition of thin films and is suitable for use in both research and industrial applications. With its advanced design and features, this tool can enable highly reproducible and reliable thin-film deposition processes.