Used AMAT / APPLIED MATERIALS P5000 Mark I #9313267 for sale
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ID: 9313267
Wafer Size: 8"
Vintage: 1996
CVD System, 8"
Process: LTO CVD, TEOS
(3) DLH
Etch chamber
1996 vintage.
AMAT / APPLIED MATERIALS P5000 Mark I, commonly referred to as AMAT P5000 Mark I, is a high-capacity high-throughput tool designed for chemical vapor deposition (CVD). APPLIED MATERIALS P5000 Mark I is capable of processing both small and large substrates sizes, making it an ideal solution for process development and research applications alike. The base configuration consists of a fully automated CVD reactant delivery equipment, a 40" substrate holder, two gas boxes to control the process flow, a reaction chamber, and a pneumatically operated vertical lift. P5000 Mark I features a new integrated data collection system for advanced process monitoring and control, and a wide range of diagnostic tools for troubleshooting and process optimization. AMAT / APPLIED MATERIALS P5000 Mark I is equipped with a gas delivery unit that allows for the control of multiple gases. The delivery of the process gases is managed through the two gas boxes, which can be sequenced to deliver repeatable results. The gas boxes can accommodate up to 16 different gases, which are then flowed through the reaction chamber using a mass flow controller. The reaction chamber is a stainless steel lined cylindrical chamber with a diameter of 20". It is capable of temperatures up to 1000°C and pressure to 10 Torr, with an 11" wafer capacity. The reaction chamber is purged by a unique pulse-purging machine that maximizes the uniformity of the process gases. AMAT P5000 Mark I also features a vertical lift, which adjusts the wafer level over the reaction chamber to enhance uniformity and stability of the process parameters. It is driven by a pneumatic tool, and can be automated for repeatable results. Additionally, it can be equipped with an optional RF generator for processes that require RF energy. APPLIED MATERIALS P5000 Mark I is a sophisticated tool with advanced technologies that allow for reliable and precise CVD processing. It offers an effective solution for process development and research applications, allowing for the production of high quality thin-film materials. The integrated data collection asset enhances process control, and the diagnostic tools support optimization and troubleshooting.
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