Used AMAT / APPLIED MATERIALS P5000 Mark II CVD #9161551 for sale

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ID: 9161551
Vintage: 1995
System Singlewafer multichamber Both chemical vapor deposition (CVD) and etching Handle 8” Silicon wafer Power rack Original PC (4) chambers: (2) For CVD (C2F6, SiO2, NF3, He, and TEOS) (2) For etching (CF4, Ar, SiO2, O2) 1995 vintage.
AMAT / APPLIED MATERIALS P5000 Mark II CVD Reactor is an intuitive and versatile densification reactor designed for a variety of applications. The P5000 Mark II is a chemical vapor deposition (CVD) system equipped with multiple process chambers for process optimization. AMAT P5000 Mark II CVD has a wealth of features designed with precision for efficient and accurate depositions. Its multi-chamber design can be used to optimize process parameters for applications such as barrier films, hard coatings, and dielectric films for diffusion control. The multi-chamber design allows for different temperature regimes for each chamber, enabling the processing of multiple applications and depositions simultaneously. Furthermore, APPLIED MATERIALS P5000 MARK-II CVD has improved process control since any process variation can be tuned depending on the material properties it wants to deposit/fabricate. In addition to its enhanced performance, P5000 MARK-II CVD also ensures safety. It is equipped with a high-resolution temperature sensor and a heated distance control to maintain process chamber atmospheres to protect operator safety while providing optimal temperature control. Other features in P5000 Mark II CVD also include an exhaust connection and closed loop system to monitor and help remove organic compounds during the process. This helps to guarantee that organic effluents do not escape into the ambient environment. Furthermore, APPLIED MATERIALS P5000 Mark II CVD also has adjustable heating elements for optimal performance and process control. Its construction features an exo-shell platen, which provides uniform temperature distribution throughout the process chamber, allowing for improved performance and longer production runs. To sum up, AMAT P5000 MARK-II CVD Reactor is an intuitive and effective system designed for delicate deposition and processes such as barrier films, hard coatings, and dielectric films. It is equipped with a wealth of features such as various process chambers for multi-application processing and adjustable heating elements for optimal performance. AMAT / APPLIED MATERIALS P5000 MARK-II CVD also provides safety through the use of a temperature sensor and closed loop systems to reduce organic effluents from entering the environment. Its construction with exo-shell platen ensures reliable process results and efficient production runs, making it the ultimate choice for CVD applications.
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