Used AMAT / APPLIED MATERIALS P5000 Mark II-J #9383810 for sale

AMAT / APPLIED MATERIALS P5000 Mark II-J reactor is a highly efficient and versatile deposition reactor designed for superior performance in semiconductor device fabrication and other applications. Its numerous features enable precise control over a variety of materials properties such as crystal structure, surface roughness, and nanoparticle deposition. This equipment features a vacuum-sealed hot wall process chamber that can range in size from small test areas to large processing wafers. It comes with a fully adjustable, precise gas delivery system and integrated computer control modules for precise and easy adjustment of all parameters for each process. Its inert atmosphere control ensures clean operation by preventing contamination from atmosphere. The advanced technology used in this reactor allows for high-quality film deposition, including silver films, dielectric layers, and metal-organic chemical vapor deposition layers. The thin-film deposition process can take place either by thermal-induced physical vapor deposition or by ion-assisted deposition. The latter technique produces more uniform and precise results by using a remote radio frequency plasma source to reduce the deposition of impurities onto the surface of the substrate. This method has been successfully used in the production of thin-film transistors, hardening of metal, surface protection, and deposition of metal and insulator thin films. The superior control of this unit enables process features with nanometer accuracy. Additionally, the uniformity of the film layer produced is well-suited for complex patterns on wafers. AMAT P5000 Mark II-J reactor also delivers excellent electrical properties and adhesion to the film layer. It uses a comprehensive set of controls to adjust temperature, flow rate, pressure, and pH levels of the deposition process, providing users with complete control over the deposition results. Another great benefit of this machine is its robustness against corrosion. Its durable design ensures reliable operation and a low requirement for maintenance and adjunction. With its wide range of features and accurate processing, AMAT/APPLIED APPLIED MATERIALS P5000 Mark II-J reactor is an ideal choice for semiconductor device fabrication.