Used AMAT / APPLIED MATERIALS P5000 Mark II-J #9389976 for sale
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ID: 9389976
WCVD System, 8"
(2) Pressers
(2) MITSUBISHI Diamond scan monitors
Monitor box
Generic LCD Unit
(2) Step tools
Cables included
Missing parts:
(2) RF Matches
(2) Heaters
(4) Lift Pins
SBC
Heater driver
NESLAB H-EX Chiller
Dry pumps
1994 vintage.
AMAT / APPLIED MATERIALS P5000 Mark II-J is a state-of-the-art multichamber Metalorganic Chemical Vapor Deposition (MOCVD) reactor that is designed to produce thin films and layers of high-purity, high-performance semiconductor materials, such as gallium arsenide (GaAs) and indium phosphide (InP). AMAT P5000 Mark II-J can deposit layers of materials onto wafers up to 4.7 inches in diameter and offers a wide range of process gases and temperatures. The cabinet-style, vertical design of APPLIED MATERIALS P5000 Mark II-J offers a variety of configurations, including single accumulators and annular reactors. Its advanced, thermally-controlled process technology operates at temperatures up to 1100C to achieve ultra-thick, low-defect films. P5000 Mark II-J is designed for maximum production yields, with increased throughput and capacity achieved through the use of advanced components and optimized gas flow. AMAT / APPLIED MATERIALS P5000 Mark II-J also has several features to ensure accurate process results. A thermal sensor array measures the temperature of the deposition chamber and is programmed to maintain a precisely-controlled, homogeneous temperature across the wafer surface. An integrated closed-loop gas feedback system provides reliable, accurate control of the process and helps to ensure repeatable results. AMAT P5000 Mark II-J also offers an array of advanced safety features, such as a high-temperature shut-off valve and an exhaust cartridge to remove any gases or vapors generated during the deposition process. APPLIED MATERIALS P5000 Mark II-J can be operated in direct or remote mode, giving users a degree of flexibility. A built-in heater and fan provide additional safety during operation. In summary, P5000 Mark II-J is a highly advanced and reliable MOCVD reactor designed to produce thin films and layers of high-purity, high-performance semiconductor materials. It offers a wide range of process gases and controllable temperatures, as well as features such as a thermal sensor array, a closed-loop gas feedback system, and a built-in heater and fan for safety during operation.
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