Used AMAT / APPLIED MATERIALS P5000 Mark II MxP R2 #9124577 for sale

AMAT / APPLIED MATERIALS P5000 Mark II MxP R2 reactor is a semiconductor-specific, next-generation, batch-type, chemical-vapor-deposition (CVD) tool. It offers advanced, large-scale production capabilities for both monolithic and passivated substrates. It is designed to meet the high throughput and low defect requirements for advanced memory and logic chip production. The equipment features an upgraded high-efficiency design and multiple independently adjustable zones that allow for the precise control of temperature, pressure, gas flow rates, pulse timing, and chemical reactants. The improved temperature control allows for higher deposition rates and better process control. With an increased number of sensors, the system can quickly measure and adjust the processes for maximum uniformity, repeatability, and highest yields. AMAT P5000 Mark II MxP R2 reactor has an upgraded automatic loader and unloader unit. This includes an improved feature recognition machine that enables automated alignment and substrate handling. The tool can accommodate up to 30 substrates in their standard electrostatic chuck carriers. The electrostatic chuck is designed to reduce strain on the wafer during processing. The asset offers an impressive range of optional features, including a water chiller, a wobble motor to reduce edge effect, substrate dewar model, heated shield gas delivery, a glow discharge cleaner, and a synchronized color LCD monitor. With APPLIED MATERIALS P 5000 MARK II MXP R2, equipment users benefit from improved run times, higher throughput, reduced cost of ownership, enhanced operability, and greater confidence in CVD processes. It is a highly reliable and robust tool designed to produce defect-free high-performance substrates. P 5000 MARK II MXP R2 is ideal for a variety of production applications, such as DRAM, flash memory, and logic chips.