Used AMAT / APPLIED MATERIALS P5000 Mark II MxP+ #9082547 for sale

AMAT / APPLIED MATERIALS P5000 Mark II MxP+ is a high-performance, multi-chamber plasma-enhanced chemical vapor deposition (PECVD) reactor equipment. It is the next generation of AMAT P5000 series of advanced plasma systems, built to deliver the highest quality deposition of thin films, including oxides, nitrides, and silicon carbide (SiC), to semiconductor wafers up to 200mm in diameter. AMAT P5000 Mark II MxP+ is a fully automated, multi-chamber system that utilizes advanced plasma technology and advanced process control capabilities to deliver consistent film deposition, even on the thinnest of semiconductor wafers. The unit is composed of a number of unique components that work together in harmony to provide the user with maximum flexibility and performance. At the heart of the machine is the integrated multi-chamber plasma source, which is capable of producing plasmas at a range of frequencies and power levels depending on the substrate requirements. This component allows for higher deposition rates and uniformity, making the tool applicable to even the thinnest of substrates. APPLIED MATERIALS P 5000 MARK II MXP+ is equipped with a high-pressure delivery asset for superior process control, ensuring uniformity across the entire wafer. Its integrated closed-loop model can also sense process parameters and make adjustments to account for inconsistencies, such as temperature variations, that may occur during the deposition process. The included automation equipment offers a unified user interface that simplifies the operating parameters configuration and process control. The system includes advanced software tools and user-friendly recipes that allow users to customize their process parameters and settings to their exact specifications. In addition, the unit includes a range of add-on options, such as an advanced gas delivery machine (GDS) and a sprayable gas supply, that provide further customization and maximum versatility. These add-ons allow users to easily configure the tool to fit their specific process needs, enabling them to optimize their deposition results. P 5000 MARK II MXP+ is designed to be highly efficient, providing high levels of precision and repeatability for all deposition processes. This asset is a great option for users looking for a high-performance, cost-effective, multi-chamber PECVD solution, and its many advanced features make it an ideal choice for those seeking the highest quality results possible.