Used AMAT / APPLIED MATERIALS P5000 Mark II MxP+ #9082548 for sale

AMAT / APPLIED MATERIALS P5000 Mark II MxP+ is a single-wafer, 400-mm PECVD (Plasma-enhanced Chemical Vapor Deposition) reactor designed for high-volume deposition processes in the semiconductor manufacturing industry. It is equipped with superior process uniformity, a wide range of process capabilities, and advanced automation features, allowing it to handle complex deposition procedures and enable fast production times. AMAT P5000 Mark II MxP+ utilizes a unique single-wafer, advanced cluster tool-based technology. This design features fast operating speeds, excellent production throughput, and superior process uniformity. The single-wafer technology eliminates the problems associated with wafer handling and enables a high degree of process repeatability and uniformity. The equipment utilizes a flexible, modular platform, providing a wide range of process capabilities. The module-per-wafer technology allows substrates to be treated with a different set of process parameters and enables the user to perform multiple-wafer processes such as etching, deposition, and ablation simultaneously. APPLIED MATERIALS P 5000 MARK II MXP+ also features advanced automation capabilities. Its built-in automation software, ATHENA, simplifies complex deposition processes and allows multiple processes to be automated and integrated with other equipment, such as inspection and metrology tools. ATHENA also provides advanced wafer tracking and data analysis capabilities, making it easier to monitor process data in real-time. The system also comes with an extensive range of accessories, including process and diagnostic chambers, end-effectors, and an alignment unit that help reduce processing times, improve the throughput of the machine, and extend its lifetime. Additionally, the tool is designed with safety in mind and is designed to meet the stringent safety criteria outlined in the European Union's Code of Practice. AMAT P 5000 MARK II MXP+ is an advanced single-wafer, 400-mm PECVD asset designed to handle complex deposition processes and is perfect for high-volume production environments. This model offers a range of process capabilities, fast processing speeds, superior process uniformity, and advanced automation, making it an ideal choice for modern semiconductor manufacturing.