Used AMAT / APPLIED MATERIALS P5000 Mark II MxP #9200085 for sale

AMAT / APPLIED MATERIALS P5000 Mark II MxP is a large area Tungsten MPCVD reactor that is designed to create thin film coatings on a variety of large substrates. The reactor is designed for use in both production and research settings and is capable of precursing deposition temperatures up to 750C. The substrate diameter can range from 2 inches to 8 inches and is held in place by a wafer chucking equipment. The vacuum chamber is equipped with a linear motorized transfer robot as well as a dual lift pin system that allows for the precise movement of the heated substrate. The unit is also equipped with several features that enable process control and monitoring. One of these features is a built-in monitor and control machine, which provides real-time feedback on the process chamber conditions. The built-in six-channel temperature monitor helps identify any temperature related irregularities and helps users adjust the chamber temperature accordingly. Additionally, the tool utilizes a six-zone dual showerhead delivery asset, which helps improve process uniformity by controlling the pressure and flow of the process gases entering the model. AMAT P5000 Mark II MxP reactor is equipped with a variety of safety features to meet stringent safety requirements. These features include an automatic shut-off mechanism for high pressure situations, a thermal fuse that prevents over-heating, and an expiration control indicator for volatile materials. In addition, the reactor has an integrated fail-safe mechanism that isolates and evacuates the chambers in the event of a power failure or other malfunction. Overall, APPLIED MATERIALS P 5000 MARK II MXP is an advanced deposition and reaction platform that is well suited for both production and research applications. The built-in features and safety protocols help simplify operation and provide users with a reliable and efficient way of producing thin film coatings on a variety of large substrates.