Used AMAT / APPLIED MATERIALS P5000 Mark II MxP+ #9200093 for sale

AMAT / APPLIED MATERIALS P5000 Mark II MxP+ is a Plasma Enhanced Atomic Layer Deposition (PEALD) reactor designed to fabricate a broad range of materials with reliable, uniform performance. Designed for research, industrial and commercial users, the equipment features the highest level of accuracy and variability for process optimization. The device is comprised of an EL-Plasma shell, a P5000 E-gun power supply, and a control unit. The EL-Plasma shell houses 2-zone heating elements, an in-situ gas mixing system, and a vacuum chamber that is hermetically sealed to maintain temperature and pressure control. The P5000 E-gun is capable of creating an output power range from 2 to 50kW, with fine tuning capability of 1kw at 1MHz. This allows the user to create plasma densities between 1.5 to 4.0 x 10^20/cm^3, giving users precise control over their deposition process. The control unit refers to the machine's monitoring technology, which uses AI-based algorithms to accurately adjust the reactor parameters during deposition, automatically optimizing deposition results. AMAT P5000 Mark II MxP+ supports a number of materials including oxides, nitrides, carbides, alloys, and metal substrates. The dual-zone heating elements in the EL-Plasma shell enable temperatures in the chamber to be maintained between 200°C and 1000°C, while pressures can range from 1 mBar to 0.1 mBar. In addition, users can precisely control substrate bias up to -1,500 Volts and ion flux up to 20 Watt/cm2. Overall, APPLIED MATERIALS P 5000 MARK II MXP+ is a powerful, reliable and precise deposition unit. It's advanced features and monitoring technology make it ideal for research, industrial and commercial users. The device is capable of reproducing results from extremely low to high temperature and pressure ranges, and can create unique deposition profiles with fine tuning of the chamber plasma and bias. The machine is designed to optimize process parameters for maximum deposition rate and uniformity for a variety of substrate and material types.