Used AMAT / APPLIED MATERIALS P5000 Mark II #293586419 for sale

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ID: 293586419
Wafer Size: 6"
System, 6" (2) Chambers Oxide etcher.
AMAT / APPLIED MATERIALS P5000 Mark II Varian reactor is a type of plasma etch reactor specifically designed to provide precise etch processing of various materials. It features a thin-film deposition equipment and is one of the most advanced dry etch systems available on the market. The system utilizes an advanced electrostatic chuck (ESC) at the substrate level, providing excellent temperature control and uniformity in the sample singulation for more uniform etching. The unit's ion beam source consists of a three-source RF plasma generator with a T-shaped cathode. The plasma is then focused into a symmetrical uniform beam and transferred to the substrate surface on which etching is to take place. The overall process is further enhanced by a pulse modulation machine which modifies the plasma within the chamber, allowing for accurate matching of the etching process parameters to the material being etched. AMAT P5000 Mark II uses a microwave annular thruster to create a non-uniform plasma distribution throughout the chamber. The plasma is then transferred to the sample via an electron cyclotron resonance with an electron beams. This allows control of the sample homogeneity while optimizing the etching process. The ion beam source utilizes an ELNA clip gun that allows high-resolution processing of precise features. The tool further features an etching-speed optimization process and data management software package that allows processing according to the desired parameters. APPLIED MATERIALS P 5000 MARK II is ideal for those requiring precise etching and thin-film deposition in various materials. It is widely used in aerospace, micro-electronics, optical sensors, and other industries that require precise etching and thin-film deposition. Furthermore, the asset comes with an extensive set of user-friendly controls, allowing for precise and accurate control of the etching process. The model is also fully compatible with standard etch processes and equipment, greatly reducing the cost and time of equipment integration. AMAT / APPLIED MATERIALS P 5000 MARK II is a reliable and efficient etch system, ideal for a wide range of industries requiring precise etching performance.
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