Used AMAT / APPLIED MATERIALS P5000 Mark II #293596177 for sale

AMAT / APPLIED MATERIALS P5000 Mark II reactor is a production-grade chemical vapor deposition (CVD) platform with multiple sources and processes in a single chamber. Ideal for harnessing the power of advanced materials, AMAT P5000 Mark II reactor offers a high deposition rate, controlled uniformity, and a smooth process ramp-up that accommodates a variety of industrially relevant materials. The equipment can handle a wide range of material systems and is proven to produce smooth and uniform layers, even at nanometer scales. APPLIED MATERIALS P 5000 MARK II system is designed for process engineering and advanced applications. Its flagship features include a large 4" square chamber, mid-frequency ECR plasma, dielectric barrier discharge plasma, and a high-capacity gas panel all housed in one unit, allowing for superior uniformity and consistency. The machine also offers fast process ramp-up, improved contamination control, and efficiency when producing high quality films, including multiple layers of conductive and insulating films. This model delivers superior uniformity, fast process ramp-up, and superior contamination control, enabling complex deposition steps and improved film quality. A variety of processes are available on AMAT P 5000 MARK II tool, such as chemical vapor deposition, atomic layer deposition, and others. The asset also incorporates an integrated gas delivery model with superior purge managements, dual source control, and sequence control. The equipment is equipped with an integrated megahertz rate interface and digital quadrant display that helps to ensure process control, aiding in establishment of process windows and levels. AMAT / APPLIED MATERIALS P 5000 MARK II reactor is an ideal tool for research and development, providing the precision and agility required for cost-effectiveness in the production of advanced and complex films. It offers high throughput and unparalleled uniformity over large areas, enabling users to produce multiple layers of films with infinite control over uniformity, thickness, and structures. The system satisfies the requirements of a broad range nanofabrication and material innovations, enabling researchers to develop new applications for semiconductor, hard disk, and optical storage devices.