Used AMAT / APPLIED MATERIALS P5000 Mark II #293596273 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is an advanced plasma etch and deposition reactor that is ideal for use in the semiconductor industry. AMAT P5000 Mark II delivers advanced processes, providing high performance and throughput, including the possibility of batch processing that helps reduce overall costs. APPLIED MATERIALS P 5000 MARK II is a fully automated, PC-controlled particle etching equipment that is capable of delivering precise, repeatable processes. With a patented self-calibrating technology, APPLIED MATERIALS P5000 Mark II ensures excellent control of the process parameters, ensuring consistent results across the many tools in the cluster. Additionally, the robot can be programmed to exchange wafers automatically from the input to the output of the system with a 6-axis robot. The reactor's process chambers are made of stainless steel construction and are designed for high usage with minimal maintenance. AMAT P 5000 MARK II offers chemical exchanges in combination with directional etching and additional ion sources, which increases the potential range of applications and processes. Moreover, the unit comes with a variety of features and capabilities such as an internal optical machine for monitoring process conditions, and a passive cooling architecture for uniform and maintenance-free operation. P5000 Mark II is compatible with a variety of substrates, including Quartz, Si, GaAs, and others. Additionally, the tool is equipped with high-precision wafer alignment and positioning systems, placing the wafer in the optimal position to ensure uniform and consistent processes. P 5000 MARK II is ideal for applications that require excellent control of the plasma etching process and uniform results, providing a high degree of accuracy and quality. With its combination of automated systems and sophisticated hardware, AMAT / APPLIED MATERIALS P 5000 MARK II is an advanced reactor that can be used in many industries requiring precision processes.