Used AMAT / APPLIED MATERIALS P5000 Mark II #293725493 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a modular inductively coupled plasma (ICP) reactor designed for multi-module deposition applications, including thin film deposition, etching, oxide passivation, and cleaning. It is a multi-module ICP reactor design, allowing the simultaneous deposition of different layers, such as protective coatings and antireflective layers. AMAT P5000 Mark II features two primary modules, an ion source and an ion collector, which produce and collect reactive fluxes for deposition and etching, respectively. Additionally, APPLIED MATERIALS P 5000 MARK II can achieve layer-to-layer transitions in a single run for split layer deposition, which maximizes process consistency and reduces required raw materials. APPLIED MATERIALS P5000 Mark II is equipped with a powerful heating and cooling equipment, with the ability to rapidly ramp the process chamber up or down to desired temperatures. This makes it perfect for use with many advanced materials and processes, such as working with indium tin oxide (ITO) and other low-temperature materials. P 5000 MARK II can also be programmed to perform repeatable deposition, etching, and cleaning cycles for complex processes. The system also features advanced process monitoring and control capabilities, allowing for precise control over the process parameters. AMAT / APPLIED MATERIALS P 5000 MARK II includes an automatic process control unit that allows for on-the-fly adjustments to parameters based on real-time changing conditions, meaning process stability can be maximized even as conditions change throughout deposition. The machine also has intuitive user-friendly software, making it easy to operate and program. In addition to its superior process control, P5000 Mark II's solid construction and low maintenance requirements make it an economical option for industrial use. Its nitrogen-free environment prevents oxidation, helping maximize material purity and process throughput. As such, it can provide highly consistent and repeatable results even in high-volume production. Overall, AMAT P 5000 MARK II is a multi-module ICP reactor designed for advanced thin film deposition and etching, oxide passivation, and cleaning applications. It features excellent process control, repeatable process cycles and advanced temperature control, making it a reliable and robust tool for industrial production.