Used AMAT / APPLIED MATERIALS P5000 Mark II #293762173 for sale

AMAT / APPLIED MATERIALS P5000 Mark II Reactor is a high-end tool designed for use in advanced semiconductor fabrication facilities. Primarily used to perform epitaxial growth processes such as forming a silicon-on-insulator (SOI) layer on a single crystal substrate, AMAT P5000 Mark II is an excellent tool to perform research, development and production applications. APPLIED MATERIALS P 5000 MARK II is an Ultra-High Vacuum (UHV) reactor with a base pressure of 10-11 Torr when operating. It is capable of achieving a 5000 °C substrate temperature and has a maximum heating rate of 15 °C/sec. The reactor includes a graphite 3-zone furnace design, with an effective zone length of 9.5 inches and a 25 zone geometry. It has a unique computer-controlled hydraulic radial lift equipment, which can be controlled from the computer user interface. AMAT P 5000 MARK II also includes an advanced multicenter epitaxy technology, providing uniformity of film thickness across a wide range of substrates, including cubic, hexagonal, and trigonal structures. APPLIED MATERIALS P5000 Mark II also offers a number of materials options for deposition and growth, including graphene and other 2D materials as well as 3D materials, with a range of precursor chemistries including Al, Si, Ge, and others. In addition to the multicenter technology, P5000 Mark II offers an active gas delivery system, offering precision control of reactants, ensuring the growth rate and stoichiometry of the material met. An advanced Stage Control Unit, operated by a Closed Loop Feedback Machine, utilizes axis motor control to maintain constant relationships between the Wafer, Showerhead, and Substrates at all times, thus ensuring a consistent film thickness and uniformity of deposition. P 5000 MARK II also includes a process monitoring tool to provide constant feedback on growth parameters, providing full real-time tracking and control of the process. Finally, AMAT / APPLIED MATERIALS P 5000 MARK II offers a vacuum break asset, allowing gas to enter the process chamber without risk of pressure fluctuations, freeing up operators for other tasks during processing. Overall, AMAT / APPLIED MATERIALS P5000 Mark II Reactor offers an unparalleled range of feature and capabilities, providing both process stability and consistency across a wide range of materials, from graphene to 3D materials, making it an excellent choice for advanced semiconductor fabrication facilities.