Used AMAT / APPLIED MATERIALS P5000 Mark II #9011652 for sale

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ID: 9011652
Wafer Size: 6"
CVD System, 6" (2) Standard chambers UNIVERSAL CVD Chamber Nitride / TEOS CVD.
AMAT / APPLIED MATERIALS P5000 Mark II is a general-purpose single-wafer wet-batch reactor ideal for both industrial and research applications. Built with silicon wafer substrates but compatible with a variety of other common materials, the processing chamber is capable of providing temperatures up to 1000°C (1830°F) and pressures up to 30 atmospheres. The equipment is designed around uniformity and automation in mind, while maintaining a safe and reliable platform unprecedented to the industry. AMAT P5000 Mark II can effectively handle plasma-enhanced chemical vapor deposition (PECVD) processes, including selective area etching, doping processes, and metal deposition. By combining a fast and powerful in-situ cleaning process, automated programmable cooling, and precise gas and exhaust controls, this reactor can help researchers and engineers achieve the most accurate and necessary deposition profiles. As a wet-batch single-wafer system, APPLIED MATERIALS P 5000 MARK II operates at low thermal budgets with automated, repeatable processes. The evacuation and heating of the unit are fast and precise with heated rail elements and flux uniformity within/across the wafer surface. The total machine is also designed with fast effluent evacuation, eliminating the need for additional dry gas for removal. Universal safety is at the forefront of P5000 Mark II's design. Completely encased in a stainless steel housing, the tool is built with a reactive backfill sensor and secure lid actuators, providing the user with enhanced safety and the added benefit of a reduced noise component. This reactor also features a patented SafetyX™ Double Process Chamber, providing removable cartridge lids and improved temperature and composition sensors in an isolated environment safe from potential cross contamination. APPLIED MATERIALS P5000 Mark II is an extremely efficient and cost-effective way to conduct demanding deposition processes with total precision. Fully automated and repeatable processes, secure safety features and an efficient thermal design enable the asset to offer excellent results quickly and without fail. When compared to other processes and equipment, P 5000 MARK II stands out as one of the most reliable and successful tools to achieve detailed wafer applications.
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