Used AMAT / APPLIED MATERIALS P5000 Mark II #9044020 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a revolutionary reactor designed for chemical processing in the semiconductor industry. It is built with a chemical vapor deposition (CVD) equipment that allows for isotropic dry etching of wafer surfaces without the need for wet chemical etching. The Mark II also boasts a unique dual-chamber design that enables it to run two different processes simultaneously - one in each chamber. This increases the efficiency of the entire process cycle, while providing higher yields and reducing cycle times. AMAT P5000 Mark II is equipped with two reaction chambers, each of which are gas-tight, temperature-controlled, and fed by independent power supplies. Additionally, the chamber features a high-end inert atmosphere, which allows for a variety of process chemistries, including oxygen and plasma-based etching. These reaction chambers are constructed of a high-temperature-resistant stainless steel, which ensures superior performance even in extreme processing conditions. Additionally, the chambers are capable of accommodating a wide range of susceptor sizes. APPLIED MATERIALS P 5000 MARK II also offers an advanced temperature control system for precise temperature settings. This unit is equipped with a temperature controller, data collection machine, and programmable logic controller (PLC) for process control. Furthermore, the P5000 offers multiple safety features, such as gas line shutoff switches and emergency stop buttons, to ensure process safety. In terms of deposition technologies, P 5000 MARK II provides the capability to deposit thin films in the 750-nm to 1.5-micron range. It also offers superior crystal quality, uniformity, and repeatability, along with a high-temperature deposition environment that ensures superior process control and yield. Furthermore, it allows for compatibility with Low Pressure Chemical Vapor Deposition (LPCVD) and Atomic Layer Deposition (ALD) processes. To sum it up, P5000 Mark II is an advanced semiconductor processing tool that boasts superior performance and process control. Its unique dual-chamber design and advanced temperature control asset make it ideal for many different kinds of high-performance processes. Additionally, its flexibility and performance make it an excellent choice for use in various semiconductor production settings.