Used AMAT / APPLIED MATERIALS P5000 Mark II #9086795 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a large-scale, professional-grade reactor used in the chemical deposition of thin films and other material. It is used in the production of semiconductor materials and other integrated circuit components. AMAT P5000 Mark II is a step-and-repeat equipment with two independent heads, each containing two slots for up to 4 process chambers. Each slot can house up to 3 chambers to accommodate a variety of processes, including thin film deposition and etch. The dual-head architecture allows for high flexibility when configuring the system. The Mark II has a loadlock unit with a maximum wafer size of 12-inch. It features an automatic transfer machine that can move wafers between slots in a single-step process. The tool's modular design allows for easy upgrading and reconfiguring, giving the user enhanced flexibility. The Mark II has a high-vacuum loadlock chamber, which holds a process pressure of up to 10-3 Torr using only a few millitorr pumps, making it ideal for demanding applications such as atomic layer deposition. The asset also offers an evacuation and venting model to allow for quick control of the process atmosphere. APPLIED MATERIALS P 5000 MARK II utilizes a gas panel, which can support multiple gas sources. The gas panel also has an integrated heat exchanger for temperature control, allowing for real-time adjustment of gas mixture for optimal process control. Additionally, the equipment has a set of advanced electrical feedthroughs for configuring individual chamber I/O and independent power supplies for each line. The system is equipped with an intuitive Windows-based control unit, offering easy configuration and control of various features. Moreover, the Mark II provides built-in recipes to streamline process development and subsequent operations. In terms of safety, the machine features a safety interlock tool to prevent any accidental operation and an emergency off switch. Additionally, the asset's ESDS capabilities protect the process chamber from ground faults and provide further protection to any workers in the vicinity. Overall, AMAT / APPLIED MATERIALS P 5000 MARK II is a highly advanced and reliable reactor model, ideal for chemical deposition of thin films and other materials. With its high-vacuum loadlock chamber, modular design, automated transfer equipment, and built-in safety features, P 5000 MARK II offers users enhanced control, precision, and flexibility for their thin film deposition needs.