Used AMAT / APPLIED MATERIALS P5000 Mark II #9097804 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a semiconductor production reactor that is used in the manufacturing of advanced microelectronics components. This equipment enables the deposition of ultra-thin oxide films on semiconductor wafers through an atomic-level deposition process. This technology can be used in the mass production of semiconductor components such as transistors, catalysts, and display components. AMAT P5000 Mark II is a high-throughput, vacuum deposition system. It has a load lock chamber with a 6-inch wafer capacity and can process up to 100 wafers per hour. The unit employs electron beam evaporation technology to ensure the uniformity of oxide deposition across the surface area of all wafers. This high-precision process has the benefit of producing films with low roughness and excellent through-thickness uniformity. APPLIED MATERIALS P 5000 MARK II uses an Argon ion source ion to sputter the film onto wafers. This sputtering process, combined with the electron-beam evaporation, provides uniform deposition of the films across a broad range of temperatures, from room temperature up to 1000°C. This high temperature capacity allows for rapid and efficient deposition of nitrides, oxides, silicides, and compound films. The process also yields films with a high purity and low defects, resulting in a higher yield of usable semiconductor parts. P 5000 MARK II's design also ensures wet and dry films are ready for the next processing stage, which helps improve overall production cycle time. AMAT / APPLIED MATERIALS P 5000 MARK II is equipped with a precision quartz monitor and controller. This helps to ensure the quality of the deposition process by controlling the energy of the ion beam, beam power, angle of incidence, and other process parameters. The machine is also equipped with an advanced graphical user interface (GUI) for ease of operation and control. APPLIED MATERIALS P5000 Mark II is a highly efficient and versatile tool for the production of semiconductors and other advanced microelectronics components. This reactor offers excellent uniformity of deposition across all wafers and enables fast and uniform processing of a wide range of materials. P5000 Mark II's advanced control tool and user-friendly GUI provide users with a reliable and efficient processing solution, optimizing the yield and quality of all semiconductor devices.