Used AMAT / APPLIED MATERIALS P5000 Mark II #9114965 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9114965
Wafer Size: 8"
CVD Nitride dielectric etcher, 8" 3-Chamber (2) 5000 CVD chamber with CVD delta teos gas box, Gold precision 5000 lamp (1) 5000/5200 CVD chamber with 5000 CVD lamp ENI OEM-12B3 RF Generator ENI OEM-12B RF Generator (3) RFPP LF-5 RF Generator (3) Astech ATL-100RA Matching network Heat exchanger.
AMAT / APPLIED MATERIALS P5000 Mark II is a state-of-the-art reactor designed for epitaxial deposition, diffusion and sidewall processing of integrated circuits. It is ideal for high volume manufacture of today's complex integrated circuits. It can operate with a variety of source types, including molecular beam line sources, with a broad range of gases and other input materials; allowing precise control over the structure and composition of the resultant epi-layer. AMAT P5000 Mark II's chamber is designed to allow precise temperature control; with a variable range of 100 - 1000°C, the chamber gives users precise control over the thermal profile of the process. It also features a high capacity turbo pump to ensure excellent gas control and lower base pressures. This enables precise control over the mass flux rates achieved during operation, as well as higher productivity for all processes. APPLIED MATERIALS P 5000 MARK II utilizes advanced computer control capability via a standard VME interface. This sophisticated computer controller enables easy replication of process conditions and accurage manipulation of the timings and sequences employed. The system also comes equipped with digital pyrometers and thermocouple feedback devices, allowing precise temperature control of the evaporation rates of source materials. P 5000 MARK II has a wide range of safety features, including a corrosion-resistant stainless steel chamber, low gas leakage rate to protect against fire and explosion, and a reinforced PECVD (plasma-enhanced chemical vapor deposition) bell for improved particle containment. Additionally, APPLIED MATERIALS P5000 Mark II includes an Ionizer to minimize particulate contamination, a Hermetically sealed vacuum system for optimal process control, and automatic pressure relief valves for added protection of personnel and equipment. P5000 Mark II is the ideal tool for high volume production of advanced and specialized integrated circuit structures. With its broad range of features and high-performance capability, AMAT / APPLIED MATERIALS P 5000 MARK II is an excellent choice for those who demand the best possible results when it comes to integrated circuit manufacturing.
There are no reviews yet