Used AMAT / APPLIED MATERIALS P5000 Mark II #9153739 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a high-performance chemical vapor deposition (CVD) reactor used extensively in the semiconductor industry. It is a plasma-enhanced CVD chamber that provides a high-quality, high-performing environment for growing advanced semiconductor materials. The system consists of a main chamber, substrate chuck, showerhead assembly, and plasma source. The P5000 main chamber is constructed with a stainless steel vacuum chamber, thermally insulating lining, and a special etch-resistant top-coat. Its aluminum substrate chuck provides precise temperature control and uniform heating in order to ensure high-quality film deposition. The chamber is outfitted with an actively cooled dome louver assembly that provides improved performance, temperature homogeneity, and uniform substrate temperature. The showerhead assembly, consisting of a gas injector, is fitted with a variety of quartz showerhead inserts along with cassette masks and metal meshes. This allows for precise control over the growth rate and composition of the film being deposited. The showerhead assembly also doubles as a susceptor for plasma treatment of the wafer. The plasma source for the P5000 is a 13.56 MHz inductive coupled RF generator. It supplies RF power to the chamber, allowing the semiconductor material to be energized and ionized. The RF generator is also dynamically tuneable, allowing precise control over the deposition, oxidation, and etch processes. AMAT P5000 Mark II is an advanced, state-of-the-art CVD reactor that combines precise control over the film deposition, uniform substrate heating and cooling, and dynamic plasma source tuning to provide superior reliability, high throughput, and superior film quality. It is an invaluable tool for the semiconductor industry, providing a consistent and reliable platform for researching and developing advanced materials.