Used AMAT / APPLIED MATERIALS P5000 Mark II #9170888 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a high-performance, automated, high-throughput plasma etch reactor designed for critical etch applications. This state-of-the-art reactor is capable of etching a wide range of materials, including semiconductors, metals, and optics, with high accuracy and repeatability. AMAT P5000 Mark II is especially well-suited for semiconductor fabrication, providing precise control and uniformity of etch rates across the entire substrate. The reactor includes a sophisticated digital microprocessor controller and programmable logic controller, giving it the ability to automatically control etching processes. It also features an integrated in-situ monitoring equipment, which continuously tracks the progress of the etching process, allowing adjustments to be made on the fly. APPLIED MATERIALS P 5000 MARK II also features a large processing chamber, which provides ample room for batch processing of larger substrates. The reactor system is designed for high-precision etching applications and features several features that optimize its performance. Edge-bias and power-leveling features allow for the controlled etching of the edges of the substrate to ensure uniformity in the etch rate. AMAT P 5000 MARK II also features a substrate rotation mechanism, which increases throughput by allowing concurrent etching of multiple substrates. Other features include an automatic endpoint detection unit, an advanced control machine with detailed process monitoring, a high-resolution digital microscope, and an embedded safety tool. AMAT / APPLIED MATERIALS P 5000 MARK II is a powerful and versatile etch reactor, capable of producing finer and more accurate etch patterns than conventional plasma etching. It's a great option for those seeking a reliable, high-quality etch reactor that is capable of handling a range of applications with precision, flexibility, and repeatability.