Used AMAT / APPLIED MATERIALS P5000 Mark II #9175069 for sale

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ID: 9175069
CVD System (1) Standard CVD chamber (1) Universal CVD chamber Can be used for nitride or TEOS CVD.
AMAT / APPLIED MATERIALS P5000 Mark II reactor is an advanced deposition tool used for the growth of high-performance thin films. The reactor is equipped with a precision pulsed-DC power unit, advanced frequency generator and a temperature controller, providing superior process control measured in nanoseconds. AMAT P5000 Mark II also has multi-zone thermal control, which allows for different temperatures in different parts of the reactor. This ensures a uniform deposition rate and uniform crystallographic parameters, even when working on materials with different properties. APPLIED MATERIALS P 5000 MARK II has a computer controlled process interface, giving users the ability to program or automatically execute the correct deposition processes. This features the latest energy-efficient technologies, such as dynamic gas flow management, which can be customised to optimise each of the deposition processes. This makes it highly customizable, enabling users to develop tailored films for any specific application. AMAT / APPLIED MATERIALS P 5000 MARK II has an ultra-high vacuum system that features a titanium getter and a titanium cathode electron bombardment source. This ensures an ultra-high vacuum environment with minimal contamination, resulting in superior film quality. The system has 5", 6" and 8" susceptors with an optional load-lock. It also has a gas inlet valve, which is used to introduce the precursors into the chamber, and a mass flow controller, which allows precise control over the gas flow rate. AMAT P 5000 MARK II is also equipped with an RS232-based personal computer interface, making it incredibly user-friendly. The reactor is also capable of being controlled and monitored remotely, enabling users to access the instrument from anywhere with an internet connection. These features make it ideal for research laboratories and manufacturing environments alike. In summary, P5000 Mark II is a powerful deposition tool capable of producing high-performance films with superior process control, advanced energy-efficient technologies, an ultra-high vacuum system, and a user-friendly interface that makes the instrument accessible from any location. It is an important tool for those working in research laboratories and manufacturing environments.
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