Used AMAT / APPLIED MATERIALS P5000 Mark II #9196212 for sale

AMAT / APPLIED MATERIALS P5000 Mark II
ID: 9196212
Wafer Size: 8"
PVD System, 8" (2) Chambers MXP Oxide chamber.
AMAT / APPLIED MATERIALS P5000 Mark II is a high-performance deposition reactor designed for applications in the semiconductor industry. This high-end equipment is a customized reactor catering to a user-specific configuration. It is designed to provide sub-micron uniformity and exceptional process capability. The system's reactants are delivered to the reaction head or susceptor through a gas delivery unit. Reactants used vary depending on the application but may include silane, oxygen, helium, nitrogen, argon, and other relevant gases. The reactants are then injected into the reaction chamber where they combine to form a reactive plasma. This plasma produces a wide range of substrates, from single-crystal wafers to nano-sized particles. AMAT P5000 Mark II has a two-stage design, allowing for multiple heating and cooling stages. Heating is achieved via various methods such as induction or quartz boat. The cooling method is based on a mass flow controller that maintains the temperature at a desired level. This machine also utilizes a Faraday shield to guide the plasma particles over the wafer during substrate processing. APPLIED MATERIALS P 5000 MARK II also comes equipped with a 3D control tool that uses integrated software to achieve precise control over the rate of deposition, temperature and substrate uniformity. This allows for better management of the process parameters and can be programmed for different process recipes. The asset is also integrated with an automated loader for increased productivity and efficiency. The model also has various safety features such as an emergency stop, alarm reporting and auto-power shutdown in case of accidents. P 5000 MARK II is easy to clean, maintain and can be retrofitted to customize the reactor for specific applications. It is a high-end equipment with enhanced features and superior control ensuring high-quality deposition and superior yields.
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