Used AMAT / APPLIED MATERIALS P5000 Mark II #9200095 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a highly advanced production-level wafer etching reactor equipment. This reactor has been engineered to offer best-in-class process control, stable operation and superb reliability throughout high-volume manufacturing operations. AMAT P5000 Mark II features an RF power supply, an advanced gas injection system, a laser-based endpoint detector and specialized Computer Process Control (CPC). This unit is designed to provide precise, submicron level lithography and etching capability, allowing for the production of highly intricate and integrated circuits. The RF power supplies of APPLIED MATERIALS P 5000 MARK II are capable of providing high power levels at an exceptionally efficient rate. The two-stage pumping machine allows for rapid and accurate gas injection to better control the etching process. A laser-based endpoint detector provides the user with feedback about the endpoint etch process which can be used to fine-tune the etching parameters. The CPC is a fully computerized control tool which provides sophisticated process control and monitoring, allowing for improved productivity, higher throughput and greater process reliability. P 5000 MARK II is equipped with an integrated tool diagnostic asset and an intuitive user interface, allowing for streamlined troubleshooting and process optimization. The reactor also includes an inert atmosphere module which ensures that the etch chamber and all process components are preventatively purged with an inert gas and maintained under a controlled environment. P5000 Mark II has extensive safety features, such as automatic shutdowns, alarms and containment protocols. These features ensure the safety of operators and maintain a higher level of control in manufacturing processes. In addition, AMAT P 5000 MARK II is capable of storing and reproducing process parameters, offering operators a better understanding of the wafer reticle etching process. APPLIED MATERIALS P5000 Mark II is an advanced etching reactor, designed specifically for high-volume and automation-enhanced production. Its capabilities include high-power RF power supplies, a gas injection model, a laser-based endpoint detector and highly advanced Computer Process Control to ensure precise and accurate lithography and etching capabilities. Its integrated safety features, intuitive user interface and equipment diagnostic capabilities make it a premier choice for demanding production applications.