Used AMAT / APPLIED MATERIALS P5000 Mark II #9213359 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a semiconductor reactor designed to be a hybrid etch/implant tool. It is a high-end system capable of conducting complex etch and implantation processes with an extremely high degree of precision. AMAT P5000 Mark II is equipped with a vacuum chamber, which houses the substrate to be processed, and is controlled by a number of independent modules, including a vacuum pump, heater, plasma source, and the main process controller. The vacuum chamber has a radius of 0.25 m, and can hold up to 8 4-inch substrates, making it suitable for a variety of substrate sizes. The substrate is heated to the appropriate temperature prior to etch or implantation processes by the built-in heater. The active plasma source then bombards the substrate, creating a highly reactive species which reacts with the surface being processed. The process is monitored and controlled by the main process controller, which can be operated with the use of a range of parameters such as temperature, pressure, and plasma power. APPLIED MATERIALS P 5000 MARK II has been designed to allow for rapid turnaround times and efficient manufacturing of Etch and Implant components. It is able to set process parameters quickly and accurately, meaning operations can be completed in a much shorter time frame. Additionally, APPLIED MATERIALS P5000 Mark II is equipped with top-of-the-line automation features, allowing for sophisticated, hands-off operation. This helps ensure consistent product quality and accuracy with minimal operator intervention. P 5000 MARK II is a powerful tool that can be used to achieve a wide range of process goals. Its combination of sophisticated engineering, high-end components, and automation capabilities make it the perfect choice for anyone looking to create the highest quality products with maximum efficiency.