Used AMAT / APPLIED MATERIALS P5000 Mark II #9239518 for sale

ID: 9239518
Wafer Size: 8"
Vintage: 1992
TEOS PECVD System, 8" SNNF (2) DXL Delta chambers 8-Slots storage Hot box 1992 vintage.
AMAT / APPLIED MATERIALS P5000 Mark II is a high-precision etching reactor designed for semiconductor processing. This reactor utilizes advanced etching techniques to etch and modify features on the nanoscale. It features state-of-the-art, user-friendly control technology to enable superior process accuracy and reliability. AMAT P5000 Mark II is equipped with Radio Frequency Induction (RFI) to provide the required power and provide etching accuracy. This equipment can etch single and double patterned substrates using an advanced pattern generator system. APPLIED MATERIALS P 5000 MARK II is able to etch patterns as small as 50 nanometers with extreme precision. The etching process is controlled by a process control unit to ensure repeatability and uniformity. P 5000 MARK II contains an advanced etch chamber with a high throughput and superior resolution. The machine is equipped with an automatic gas distribution tool for efficient gas mixtures and in-situ monitoring for accurate process control. The etch chamber is integrated with a vacuum asset to optimize etch performance and provide improved resistivity. AMAT / APPLIED MATERIALS P 5000 MARK II is also equipped with an advanced process control model. This equipment is composed of a computer equipped with user-friendly interface and programmable alarm features. The process control system can be tailored to meet specific etching requirements. In addition, a Recipe Design Tool is available for development of custom etch recipes for specific applications. P5000 Mark II also offers an advanced etching unit with a selection of advanced etching components. This includes a rotating arm with adjustable speed and pitch, a gas mask and a gas supply machine. The tool also includes an automated etcher protect asset to maintain etch accuracy and reduce the possibility of resistivity damage. APPLIED MATERIALS P5000 Mark II is capable of performing high-precision etching operations for a wide range of applications. This model is designed for increased efficiency, repeatability and reliability. AMAT P 5000 MARK II is the ideal equipment for complex semiconductor etching tasks and can provide users with superior results.
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