Used AMAT / APPLIED MATERIALS P5000 Mark II #9298984 for sale

AMAT / APPLIED MATERIALS P5000 Mark II is a single-wafer electrochemical reactor used in semiconductor device manufacturing. AMAT P5000 Mark II has a unique design that combines a robust chamber construction and multiple paddle systems, enabling high throughput and low particle contamination. The chamber design consists of a hot-wall structure with a chamber volume of 8 liters. The chamber is completely sealed and allows for a higher pressure than the traditional cold-wall setup. The paddle system includes two top and bottom paddles, and a heater support assembly. This design allows for a high throughput of wafers, as the wafers are evenly spaced and agitated during the entire process. The chamber is constructed with a stainless steel chamber body, a vacuum-fitted chamber lid, an O-ring chamber lid seal, Teflon coated chamber walls, and a quartz-lined heater block. The Mark II also features an integrated peristaltic pump, allowing for accurate and efficient delivery of chemicals and reactants. The pump's programmable controller allows for precise pump speeds and chemical flow rates. The Mark II also offers an array of additional features, such as selectable dual voltage operation, multiple cooling options, and a heated exhaust vacuum. The heated exhaust vacuum maintains a consistent temperature throughout the process, while the cooling options help control the reaction rate. The Mark II can also be equipped with a variety of additional accessories, including gas panels, gas regulators, valves, and multiple port capacitance-coupled plasma (CCP) sources. These accessories allow for a range of processing tasks, including etching, oxidation, deposition, and more. Overall, APPLIED MATERIALS P 5000 MARK II is a robust, efficient, and reliable single-wafer electrochemical reactor designed for semiconductor device manufacturing. It features a hot-wall chamber construction with a maximum chamber pressure of 2.5 torr, a multiple paddle system for high throughput, an integrated peristaltic pump for precise flow control, and multiple port CCP sources for a variety of processing tasks.