Used AMAT / APPLIED MATERIALS P5000 Mark II #9298986 for sale

AMAT / APPLIED MATERIALS P5000 Mark II reactor is a high-precision substrate processing equipment designed to provide users with superior performance for IC-integrated (Integrated Circuit) production. This tool utilizes multi-step processes for perfecting silicon wafers, including ion implantation, epitaxial layer deposition, and device etching. The system is designed to handle as many as 106 wafers per hour, so its substrate size is 8 inches or 200 mm. AMAT P5000 Mark II utilizes inductively coupled plasma (ICP) electric fields to produce the ions necessary for doping selected areas on the substrate. This method is highly repeatable and accurate, allowing the tool to produce superior ICs in a cost-effective manner. Additionally, APPLIED MATERIALS P 5000 MARK II can control various parameters including pressure, temperature, and concentration, which increase the control and accuracy of the tool in producing the desired doped areas on the substrate. The unit is equipped with both an advanced primary chamber, used in epitaxial deposition, and an advanced second chamber, used in etching. This allows users to take advantage of both stages in their production process. The primary chamber utilizes a gas delivery machine to ensure the accuracy and stability of doping. This gas delivery tool is constantly monitored and managed in order to maintain a constant and consistent doping process. In order to maximize performance and reduce waste, APPLIED MATERIALS P5000 Mark II utilizes a proprietary 3D Auto-Asset Interface. This interface provides the operator with a graphical representation of the process, showing key parameters and settings in real-time. This allows for a much easier process for setting processing times, temperatures, and other variables. In summary, the APPLIED MATERIA P5000 Mark II™ is an advanced substrate processing tool designed to provide superior performance for IC-integrated production. Its advanced ICP electric field doping process allows for increased accuracy and repeatability and helps maintain cost-effectiveness. The tool is also equipped with an advanced primary and secondary chambers and a proprietary 3D Auto-Model Interface that provides the operator with a graphical representation of the process. This allows operators to easily set variables and maximize performance while reducing waste, making it a superior tool for producing intricate ICs.