Used AMAT / APPLIED MATERIALS P5000 Mark II #9300021 for sale
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ID: 9300021
Wafer Size: 8"
Vintage: 1997
CVD Etcher, 8"
Mainframe
Mainframe cables
Chamber A / B / C:
Type: DCVD Universal
Process: SA / Delta / TEOS
Process kit: Plasma C-chuck
Manometer: Dual 20-1000 Torr/MKS
Clean method: RF Clean
Throttle valve: Direct drive dual spring W/C plug
ASTEX AX8200 Ozone generator
Gas box MFC: UNIT MFC
Lamp driver
RF Gen I / II: RFDS 2000-2V/RFPP LF-5
RF Match: Phase IV
Chamber D:
Process: Sputter etcher
Process kit
Manometer: Single Torr/MKS
Clean method: RF Clean
Throttle valve
Turbo pump
Magnet driver
Gas box MFC: UNIT MFC
RF Gen I / II: ENI OEM 12B
RF Match: Phase IV
21-Controller slots
SBC Board type: V21 SYNERGY
Boss ROM version: E4.8
Video board type: VGA
Floppy Disk Drive (FDD), 3.5"
Robot type: Phase III
Auto-load / Unload cassette handler
Silicon-Tin-Oxide (STO) elevator type: 15-Slots
WPS Sensor
I/O Wafer sensor
Loadlock Purge
Loadlock Slow vent
Slit valve type: ZA Slit valve
Hot box version: Version IV
Top / Standard exhaust line
(28) Gas line panels
HAMART-4 Ozone monitor
Mini controller
Chiller
Safety module: (2) EMO Switches
Remote frame
EMO Switch
Expanded VME: (15) Slots
No Monitor rack
CRT Monitor
Light pen
Service monitor rack
Miscellaneous:
No Hard Disk Drive (HDD)
Transformer
Laminar flow hood
No mainframe cover
Load lock chamber:
Robot type: Phase III robot
Robot blade: 8"
Continuous purge
Center finder board
TC Gauge
ATM Switch
Vacuum switch
Vacuum sensor (TC)
System electronics:
(2) TC Gauge boards
+12 VDC Power supply
+15 VDC Power supply
-15 VDC Power supply
Buffer I/O board
AI MUX Board
Optical sensor boards
Chopper driver boards
Pneumatic control PCB
Main DC power supply
VME Controller:
Intelligent interface board
Missing SBC board
SEI Board
Co-processor board
(4) AI/AO / AI/O Boards: (1 AI and 1 AO)
Missing video board (VGA)
(4) Stepper boards
(4) DI/DO / DI/O Boards (7)
System misc:
Remote wiring dist board
System wiring dist board
No I/O Distribution board
Mini controller
Heat exchanger
Process / A / B / D
Mark II TEOS / CVD TEOS / CVD TEOS
RF Generator 1 / RFDS 2000-2V / RFDS 2000-2V / RFDS 2000-2V
O3 Generator / AX-8200 / AX-8200 / AX-8200
LF Generator / RFPP LF-5 / RFPP LF-5 / RFPP LF-5
TC Gauge
Isolation V/V / Cluster type
Interlock:
Coolant flow
Half ATM switch
Lamp module
CVD Lamp driver
Lift assy:
Susceptor lift assy
Wafer lift assy
Gas panel:
Gas panel interface
Expanded gas panel PCB
Standard or expanded module
Air maker
1997 vintage.
AMAT / APPLIED MATERIALS P5000 Mark II reactor is a powerful, large-scale production plasma etching and deposition equipment. This system is widely used in the fabrication of integrated circuits, such as memory and logic chips, as well as display panels, sensors, and other microelectronic devices. It utilizes a proprietary high-density inductively coupled radio-frequency powered plasma source to create an ionized gas which reacts with a substrate to create the desired process outcome. The engine of AMAT P5000 Mark II reactor consists of a vacuum chamber, microwave generator, support structures, and a high-power RF generator. The high-power RF generator generates an electric field of up to 200,000 volts at a frequency of 13.56 MHz. This high-power field ionizes the process gas, providing a plasma that is capable of completing the etching process and deposition. The generator also controls the deposition rate and temperature, thus allowing for accurate control of the final result. The reactive gas of APPLIED MATERIALS P 5000 MARK II reactor consists of a combination of chemical compounds including chlorine and nitrogen-based gases. These react with the substrate to create a variety of processes such as etching, deposition, and passivation. The reactor is also capable of performing oxygen ashing and chemical-mechanical polishing (CMP) processes. P 5000 MARK II reactor has numerous safety features and automation to ensure a high level of safety. For example, the reactor is housed within an inert-gas filled chamber to protect both the equipment and the operator from a potentially hazardous environment. Furthermore, the unit includes a temperature monitor and alarm machine that shuts down the tool if the temperature exceeds certain levels. In conclusion, P5000 Mark II reactor is a powerful, advanced plasma etching and deposition asset that provides precise control over the deposition rate and temperature. It is designed for high-volume production and safety, and is used extensively in the fabrication of ICs and other electronic devices.
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