Used AMAT / APPLIED MATERIALS P5000 Mark II #9313058 for sale

Name: AMAT / APPLIED MATERIALS P5000 Mark II
Brand: AMAT / APPLIED MATERIALS
SKU: 9313058
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Reactors

Manufacturer

AMAT / APPLIED MATERIALS

Model

P5000 Mark II

ID: 9313058

Wafer Size: 8"

CVD System, 8" Gas panel facilities: Top feed multi-line Gas panel exhaust: Top feed Robot blade: Metal Wafer type: Notch Gas panel type: Version 4 hot box Liquid source: Hot box (3) TEOS Sources: Heated ampoule EMO's: Momentary Gas lines: (12) Lines Robot type: Standard System umbilicals: 25ft MF Facilities: Rear Mainframe: Phase II Load lock slit valves: Chemrez Heat exchanger 1: AMAT 0 VME Rack: Extended 21-slots Hard Disk Drive (HDD): 4.5 GB Chamber A: Type: CVD Universal Process A: BPSG TEOS Lid type: Single gas feed-thru Susceptor / Pedestal: TEOS Heater / Cathode cooling: AMAT 0 Process kit type: Undoped TEPO Slit valve O-ring: Chemraz Chamber O-rings: Chemraz HF Generator: OEM 12 B RF Match: Phase 4 CVD Dual manometer: Manometer 1: 10 Torr Manometer 2: 100 Torr Chamber A gasses: Gas / MFC Size / Gas name / MFC Type Gas 1 / 4 Slm / N2 / UNIT 1661 Gas 2 / 2 Slm / O2 / UNIT 1661 Gas 3 / 3 Slm / C2F6 / UNIT 1661 Gas 4 / 1.5 Slm / He / UNIT 1661 Remote 1: LFC Size / Liquid name / LFC Type / Gas stick 3 Slm / TEOS / UNIT 9660 / Nupro Chamber B: Type: CVD Universal Chamber process: PRSP Lid type: Single gas feed thru Susceptor / Pedestal: TEOS Heater / Cathode cooling: Steel head 0 Slit valve O-ring: Chemraz Chamber O-rings: Chemraz HF Generator: OEM 12 B RF Match: Phase 4 CVD Process kit type undoped TEOS Dual manometer: Manometer 1: 10 Torr Manometer 2: 20 Torr Chamber B gasses: Gas / MFC Size / Gas name / MFC Type Gas 1 / 5 Slm / N2 / UNIT 1661 Gas 2 / 3 Slm / O2 / UNIT 1661 Gas 3 / 2 Slm / C2F6 / UNIT 1661 Gas 4 / 1.5 Slm / He / UNIT 1661 Remote 1: LFC Size / Liquid name / LFC Type / Gas stick 3 Slm / TEOS / UNIT 9660 / Nupro Missing parts: Mini SBC board SBC Board A/I (3) DI/O Hot box components Gas box gas interface PCB Power supply: 208 VAC. 400 Amp, 50 Hz Transformer.

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AMAT / APPLIED MATERIALS P5000 Mark II is a cutting-edge technology-based processing reactor used for various etching, thin-film deposition and heat-treatment processes. It has a chamber volume capacity of up to 5 liters and a maximum operating temperature of 950 degrees Celsius. AMAT P5000 Mark II is constructed with a robust stainless steel architecture and features a hermetic design with a flat-plane top that facilitates long-term heat-transfer efficiency. The unit also has integrated temperature control, part storage and automated cleaning capabilities that allows for high-volume production. Its programmable cycle control capability also allows operators to easily change parameters to optimize process conditions for maximum efficiency. APPLIED MATERIALS P 5000 MARK II can be customized to accommodate various types of liquids, gases, and solids for its various processes. It can be used for chemical vapor deposition (CVD), physical vapor deposition (PVD), photo-grade chemical etching, and directional etching, as well as for heat treatment. The temperature of APPLIED MATERIALS P5000 Mark II is also adjustable from room temperature to 950 degrees Celsius in intervals of 10 degrees, allowing for process consistency across batches. It is also equipped with a built-in safety device to prevent any hazardous event such as gas buildup or leaks. In addition, P 5000 MARK II can be combined with AMAT proprietary processing gases in order to maximize product performance and increase the reliability of the system. This reactor also features an intuitive touchscreen interface, allowing operators to quickly and easily access the controls. For additional safety and process control, P5000 Mark II has a built-in data logging feature that tracks operational parameters, enables remote diagnostics, and sends out alarms when parameters are outside of preset limits. With its advanced features, AMAT P 5000 MARK II is an excellent choice for aerospace, automotive, medical device, and advanced industrial applications.