Used AMAT / APPLIED MATERIALS P5000 Mark II #9313061 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9313061
Wafer Size: 8"
Vintage: 1993
Etcher, 8"
Gas panel facilities: Top feed single-line
Gas panel exhaust: Top feed
Robot blade: Metal
Wafer type: Notch
Gas panel type: UHP
EMO's: Momentary
Gas lines: (28) Lines
Robot type: Standard
System umbilicals: 25ft
MF Facilities: Rear
Mainframe: Phase II
Load lock slit valves: Viton
NESLAB Heat exchanger
VME Rack: Standard
Hard Disk Drive (HDD): 4.5 GB
Chamber A:
Chamber process: Oxide
Lid type: MxP+ Clamped
Susceptor / Pedestal: RIE
NESLAB Heater / Cathode cooling
Slit valve O-ring: Chemraz
Chamber O-rings: Chemraz
NESLAB Wall cooling
Single manometer: 1 Torr
Throttle valve: Direct drive
Gas valves: Nupro
Chamber clamps
Chamber B:
Chamber process: Oxide
Single manometer: Manometer 1 Torr
Throttle valve: Direct drive
Susceptor / Pedestal: RIE
NESLAB Wall cooling
NESLAB Heater / Cathode cooling
LEYBOLD Turbo pump
Chamber B gasses:
Gas / MFC Size / Gas name
Gas 1 / 100 Sccm / CHF3
Gas 2 / 200 Sccm / Ar
Gas 3 / 50 Sccm / CF4
Gas 4 / 200 Sccm / O2
Gas 5 / 20 Sccm / O2
Gas 6 / 100 Sccm / N2
Gas valves: Nupro
VME Rack and chamber parts missing
Power supply: 208 Vac. 400 Amp, 50 Hz Transformer
1993 vintage.
AMAT / APPLIED MATERIALS P5000 Mark II reactor is a versatile and cost-effective tool for nanofabrication, nanocharacterization, and advanced material deposition. This technologically advanced reactor is designed with two independently-controlled high precision heated stages, a pressure chamber filled with inert gas, and a graphite susceptor. Its pressure chamber of 90 mm maximum allows for various advanced materials to be processed by creating high temperature processing up to 1200° C. The dual source system allows for the coating of advanced materials simultaneously, each with the capability of accepting up to four sources. The reusable susceptor is constructed of graphite, which offers excellent thermal conductivity and has a high melting point. The susceptor is used to control the temperature of each heated plate separately when performing nanocharacterization experiments such as surface characterization and sample analysis. The susceptor is also used to evaporate materials such as metal and semiconductor films when deposition is necessary. The temperature of each substrate can be varied independently. A quartz tube is provided with AMAT P5000 Mark II reactor to provide an inert environment. The quartz tube is filled with an inert gas to protect the advanced materials from oxidation or other degradation caused by reaction with ambient air. APPLIED MATERIALS P 5000 MARK II reactor is a versatile and cost-effective nanofabrication tool. Its dual source system allows multiple materials to be processed simultaneously, and its independently-controlled heated stages provide precise temperature control. The graphite susceptor ensures the efficient transfer of heat to the substrates, and the inert gas environment helps protect the advanced materials from oxidation or degradation. AMAT P 5000 MARK II reactor is capable of creating high temperature processing up to 1200° C, making it ideal for advanced material deposition and nanocharacterization experiments.
There are no reviews yet