Used AMAT / APPLIED MATERIALS P5000 Mark II #9365936 for sale

AMAT / APPLIED MATERIALS P5000 Mark II reactor is a type of plasma processing tool designed for applications such as etching, deposition, and physical vapor deposition. This stand-alone, self-contained equipment is capable of supporting a variety of plasma processes in a single chamber, enabling a streamlined production process. AMAT P5000 Mark II makes it possible to quickly and efficiently alter the properties of semiconductor and other materials through plasma processing techniques, enabling rapid prototyping and rapid manufacturing of custom components. APPLIED MATERIALS P 5000 MARK II is an advanced plasma processing system. It uses a unique and proprietary combination of dual showerhead source and patented plasma source module design to generate a high-density RF plasma for a wide range of processing applications. The features of the unit include both process-controlled vacuum environments and automated plasma processing technologies. The machine consists of a main chamber, process chamber, and dedicated controller. The main chamber is a cylindrical stainless steel enclosure, measuring 180 cm (71") in diameter and 371 cm (146") in length. This allows for a wide range of processing parameters to be employed. The process chamber is inside the main chamber, and can accommodate various components for processing. All plasma processing is done in the process chamber. The dedicated controller operates the cluster-style process recipe tool, allowing for effective and efficient matching of the process conditions to the application needs. This controller also manages the plasma source, allows manual- or automated-programmed deposition, and provides process parameter control over substrate heating, cool-down, and end-point detection, as well as providing a variety of sensing and feedback systems throughout the process. P 5000 MARK II asset is capable of handling all dies sizes up to a 15 × 15 inch (38 × 38 cm) workpiece. It can also handle substrates up to 300 mm (12") in thickness. In addition, the fully automated model offers advanced process integration, best-in-class RF power generator and process support, and software tools designed to optimize the production process and achieve optimum performance results. AMAT P 5000 MARK II is an advanced plasma processing equipment designed to meet the needs of a wide range of plasma etch, deposition, and physical vapor deposition processes. With its user-friendly, powerfully featured system, APPLIED MATERIALS P5000 Mark II offers increased process efficiency, reliability, and performance, allowing for rapid prototyping and rapid manufacturing of custom components with plasma processing techniques.