Used AMAT / APPLIED MATERIALS P5000 Mark II #9398766 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9398766
Wafer Size: 8"
Vintage: 2005
Etcher, 8" Robot: P5000 std robot, 8" (3) Chambers (A, B, C) Type: M Chuck Throttle valve type ALCATEL Turbo Turbo controller: NT340M (2) CFF 450 0010-09416 RF Matcher Orienter chamber: D OEM 12B-02 AC Rack generator Gas box: MFC: STEC 4400 Nupro manual valve Pneumatic diaphragm valve: Nupro Sub module: (2) AMAT-0 Heat exchangers HX-150 Chiller P/N: 0010-76036 Mini controller 2005 vintage.
AMAT / APPLIED MATERIALS P5000 Mark II reactor is an advanced semiconductor processing tool designed for the manufacture of semiconductor devices. The reactor uses an inductively coupled plasma (ICP) to form the plasma etch process. An ICP is an alternating current (AC) in which ions, electrons and other particles form a plasma when excited. This plasma creates an intense electric field, which leads to accelerated chemical reactions and the etching of material. AMAT P5000 Mark II reactor is composed of an exclusive load lock with a temperature range of 20°-200° C and a high-resolution LED display to provide real-time temperature feedback. The system also features sample diagnostics and real-time monitoring capabilities to ensure sample accuracy and performance. This reactor is designed to maintain a uniform plasma during etching, which is made possible by an automatic, high-voltage wave length equalizer to ensure a stable plasma source. This is an important factor in creating reliable and consistent parts during etching, as the wave length of the plasma can vary depending on power, gas flow and pressure. A single window chamber and 6 N2 cooled inductively coupled plasma (ICP) sources improve accuracy and repeatability for improved throughput. This reactor also offers optional single wafer operation for processing both production and prototyping materials. To increase efficiency of the system, a team of experienced AMAT engineers can perform RF tuning and troubleshooting, as well as offer optimization and process development services. There is also a suite of support software available to support process development, automation and monitoring of this system. APPLIED MATERIALS P 5000 MARK II reactor is capable of manufacturing semiconductor devices with a single wafer process in a repeatable and reproducible fashion, which is critical to achieving reliable, cost-effective products. As a result, P5000 Mark II, is an ideal tool for industrial fabrication of all semiconductor device types.
There are no reviews yet